Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE | P22303 | 1/20 | 0.36 |
| ▸ | BACE1 | P56817 | 1/20 | 0.36 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.35 |
| ▸ | CA2 | P00918 | 1/20 | 0.35 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.34 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.33 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | MAPT | P10636 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | LCK | P06239 | 1/20 | 0.33 |
| ▸ | PPARD | Q03181 | 1/20 | 0.33 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.33 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.32 |
| ▸ | ASAH1 | Q13510 | 2/20 | 0.32 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6670573 | 0.85 | CA2 (0.36) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL6670570 | 0.85 | CA2 (0.36) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL6669499 | 0.79 | CA2 (0.34) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL6671423 | 0.79 | CA2 (0.38) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL6669496 | 0.79 | CA2 (0.34) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL6671424 | 0.79 | CA2 (0.38) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL8060421 | 0.77 | ACHE (0.49) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL886787 | 0.75 | — | — | |
| SCHEMBL6472685 | 0.74 | CA2 (0.42) | ACHEBACE1MAPK1CA2GPR84 | |
| SCHEMBL4946239 | 0.73 | CA2 (0.41) | ACHEBACE1MAPK1CA2GPR84 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8147923-B2 | BLENDS CONTAINING ACRYLATED ESTERS AND ADDITION POLYMER | BASF COATINGS GMBH (DE) | 2012-04-03 | — | — | US | claimed |
| US-10590229-B2 | Polyurethane coating compositions | COVESTRO DEUTSCHLAND AG (DE) | 2020-03-17 | — | — | US | disclosed |
| US-20180298138-A1 | POLYURETHANE COATING COMPOSITIONS | COVESTRO DEUTSCHLAND AG (DE) | 2018-10-18 | — | — | US | disclosed |
| EP-1830204-B1 | CLOSE-BONDED DIFFRACTIVE OPTICAL ELEMENT, OPTICAL MATERIAL USED THEREFOR | NIKON CORP (JP) | 2018-10-17 | — | — | EP | disclosed |
| US-8883399-B2 | Ablation layer, photosensitive resin structure, and method for producing relief printing plate using the photosensitive resin structure | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2014-11-11 | — | — | US | disclosed |
| US-8835524-B2 | Resin precursor composition and resin obtained by photocuring the same | NIKON CORPORATION (JP) | 2014-09-16 | — | — | US | disclosed |
| EP-2381309-B1 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | ASAHI KASEI E MATERIALS CORP (JP) | 2013-08-07 | — | — | EP | disclosed |
| US-8445180-B2 | Water-developable photopolymer plate for letterpress printing | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2013-05-21 | — | — | US | disclosed |
| US-20120309863-A1 | RESIN PRECURSOR COMPOSITION AND RESIN OBTAINED BY PHOTOCURING THE SAME | NIKON CORPORATION (JP) | 2012-12-06 | — | — | US | disclosed |
| US-20110275016-A1 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2011-11-10 | — | — | US | disclosed |
| EP-2381309-A1 | ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE | Asahi Kasei E-materials Corporation (JP) | 2011-10-26 | — | — | EP | disclosed |
| US-20070160933-A1 | Water-developable photopolymer plate for letterpress printing | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2007-07-12 | — | — | US | disclosed |