Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.64 |
| ▸ | TSHR | P16473 | 3/20 | 0.64 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.64 |
| ▸ | LMNA | P02545 | 1/20 | 0.64 |
| ▸ | THRB | P10828 | 1/20 | 0.45 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | MGAM | O43451 | 1/20 | 0.37 |
| ▸ | SI | P14410 | 1/20 | 0.37 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.37 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.37 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.37 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.37 |
| ▸ | CHRM5 | P08912 | 2/20 | 0.37 |
| ▸ | CHRM1 | P11229 | 2/20 | 0.37 |
| ▸ | CHRM3 | P20309 | 2/20 | 0.37 |
| ▸ | PGR | P06401 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethyl Acetate SCHEMBL10623401 | 0.98 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Ethyl Acetate SCHEMBL10582690 | 0.96 | ALDH1A1 (0.59) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Diethylene Glycol Monoethyl Ether SCHEMBL6899107 | 0.96 | ALDH1A1 (0.65) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Ethyl Acetate SCHEMBL5066881 | 0.94 | ALDH1A1 (0.57) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Di(Hydroxyethyl)Ether SCHEMBL181560 | 0.93 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Di(Hydroxyethyl)Ether SCHEMBL566173 | 0.93 | ALDH1A1 (0.67) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Diethylene Glycol Monoethyl Ether SCHEMBL10628086 | 0.92 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Triethylene Glycol SCHEMBL273265 | 0.91 | ALDH1A1 (0.59) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Tetraethylene Glycol SCHEMBL2702054 | 0.91 | ALDH1A1 (0.59) | ALDH1A1TSHRHSD17B10LMNATHRB | |
| Tetraethylene Glycol SCHEMBL16143312 | 0.91 | ALDH1A1 (0.64) | ALDH1A1TSHRHSD17B10LMNATHRB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 18963 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147279-A1 | DEVELOPER COMPOSITION FOR METAL-CONTAINING PHOTORESIST, AND METHOD OF FORMING PATTERNS INCLUDING DEVELOPING METHOD USING THE COMPOSITION | SAMSUNG SDI CO., LTD. (KR) | 2026-05-28 | — | — | US | claimed |
| CN-122095033-A | Formulations | — | 2026-05-26 | — | — | CN | claimed |
| WO-2026107431-A1 | STEREOSELECTIVE SYNTHESIS OF L,2-CIS-2-AMINOGLYCOSIDES | BRANDEIS UNIVERSITY (US) | 2026-05-21 | — | — | WO | claimed |
| WO-2026104328-A1 | FORMULATION | MERCK PATENT GMBH (DE) | 2026-05-21 | — | — | WO | claimed |
| EP-4072992-B1 | COMPOSITION | SAMSUNG ELECTRONICS CO LTD (KR) | 2026-04-08 | — | — | EP | claimed |
| US-12570057-B2 | Method of producing nonlinear optical device | NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY (JP) | 2026-03-10 | — | — | US | claimed |
| CN-121578590-A | Composition for forming lower layer film of patterning material and lower layer film of patterning material | 珠海基石科技有限公司 | 2026-02-27 | — | — | CN | claimed |
| EP-4616684-A1 | LIQUID CRYSTALLINE SAM VIA SPIN-COAT ASSEMBLY AND THEIR AREA SELECTIVE DEPOSITION PROPERTIES | Merck Patent GmbH (DE) | 2025-09-17 | — | — | EP | claimed |
| EP-4615891-A1 | DSA OF LIQUID CRYSTAL BLOCK COPOLYMERS FOR INTEGRATED CIRCUIT PATTERNING | Merck Patent GmbH (DE) | 2025-09-17 | — | — | EP | claimed |
| CN-120065627-A | Photosensitive composition, battery piece containing photosensitive composition and preparation method of battery piece | 苏州捷得宝机电设备有限公司 | 2025-05-30 | — | — | CN | claimed |
| US-4617254-A | Process for forming detailed images | CHISSO CORPORATION (JP) | 1986-10-14 | — | — | US | claimed |
| US-4579801-A | MULTILAYER WITH PHENOLIC RESOLE BETWEEN SUBSTRATE AND PHOTOSENSITIVE LAYER | CANON KABUSHIKI KAISHA (JP) | 1986-04-01 | — | — | US | claimed |
| US-4554237-A | Photosensitive resin composition and method for forming fine patterns with said composition | HITACH, LTD. (JP) | 1985-11-19 | — | — | US | claimed |
| US-4504567-A | Light-sensitive lithographic printing plate | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-03-12 | — | — | US | claimed |
| EP-0112168-A2 | Silicone-type coating resin solution and its preparation | FUJITSU LIMITED (JP) | 1984-06-27 | — | — | EP | claimed |
| US-4414314-A | Resolution in optical lithography | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1983-11-08 | — | — | US | claimed |
| US-4409317-A | PHOTORESISTS, POLY-P-VINYLPHENOL | HITACHI, LTD. (JP) | 1983-10-11 | — | — | US | claimed |
| EP-0090089-A2 | Resist material and process for forming fine resist pattern | Daikin Kogyo Co., Ltd. (JP) | 1983-10-05 | — | — | EP | claimed |
| EP-0083078-A2 | Photosensitive resin composition and method for forming fine patterns with said composition | Hitachi, Ltd. (JP) | 1983-07-06 | — | — | EP | claimed |
| US-4264715-A | COMPRISING POLYMETHACRYLIC ANHYDRIDE WHICH IS IRRADIATED AND DEVELOPED WITH A SOLVENT-NONSOLVENT MIXTURE | VLSI TECHNOLOGY RESEARCH ASSOCIATION (JP) | 1981-04-28 | — | — | US | claimed |