Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.59 |
| ▸ | TSHR | P16473 | 3/20 | 0.59 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.46 |
| ▸ | MEN1 | O00255 | 2/20 | 0.46 |
| ▸ | THRB | P10828 | 2/20 | 0.42 |
| ▸ | HTT | P42858 | 1/20 | 0.42 |
| ▸ | MAPT | P10636 | 1/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.42 |
| ▸ | CYP4F2 | P78329 | 1/20 | 0.39 |
| ▸ | CYP4A11 | Q02928 | 1/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.34 |
| ▸ | MGAM | O43451 | 1/20 | 0.34 |
| ▸ | SI | P14410 | 1/20 | 0.34 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.34 |
| ▸ | SOAT1 | P35610 | 1/20 | 0.34 |
| ▸ | PGR | P06401 | 1/20 | 0.34 |
| ▸ | CHRM2 | P08172 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetraethylene Glycol SCHEMBL2702054 | 1.00 | ALDH1A1 (0.59) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL181560 | 0.98 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Diethylene Glycol Monoethyl Ether SCHEMBL10628086 | 0.96 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Diethylene Glycol Monoethyl Ether SCHEMBL6899107 | 0.96 | ALDH1A1 (0.65) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Tetraethylene Glycol SCHEMBL16143312 | 0.96 | ALDH1A1 (0.64) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Ethyl Acetate SCHEMBL10623401 | 0.94 | ALDH1A1 (0.61) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Di(Hydroxyethyl)Ether SCHEMBL566173 | 0.94 | ALDH1A1 (0.67) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Triethylene Glycol SCHEMBL925608 | 0.93 | ALDH1A1 (0.52) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Ether SCHEMBL243266 | 0.92 | ALDH1A1 (0.72) | ALDH1A1TSHRHSD17B10LMNAKMT2A | |
| Ether SCHEMBL1401416 | 0.92 | ALDH1A1 (0.72) | ALDH1A1TSHRHSD17B10LMNAKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 592 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115895377-B | Solvent type high refractive index composition and application thereof in OLED display device | 西安思摩威新材料有限公司 | 2023-11-24 | — | — | CN | claimed |
| CN-115895377-A | Solvent type high-refractive-index composition and application thereof in OLED display device | 西安思摩威新材料有限公司 | 2023-04-04 | — | — | CN | claimed |
| CN-102453149-A | Olefin polymerization catalyst component, olefin polymerization catalyst, and olefin polymerization method | CHINA PETROLEUM & CHEMICAL | 2012-05-16 | — | — | CN | claimed |
| US-20060011584-A1 | Etchant and etching method | DAIKIN INDUSTRIES, LTD. (JP) | 2006-01-19 | — | — | US | claimed |
| EP-1538664-A1 | ETCHANT AND ETCHING METHOD | Daikin Industries, Ltd. (JP) | 2005-06-08 | — | — | EP | claimed |
| US-12630727-B2 | Photocurable inkjet printing ink composition | SAKATA INX CORPORATION (JP) | 2026-05-19 | — | — | US | disclosed |
| CN-122029488-A | Photosensitive coloring composition, cured product, partition wall, organic electroluminescent element, color filter, and image display device | 三菱化学株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-07 | — | — | US | disclosed |
| US-12588446-B2 | Surface treatment composition and method for producing wafer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2026-03-24 | — | — | US | disclosed |
| US-12570865-B2 | Active energy ray-curable inkjet printing ink composition | SAKATA INX CORPORATION (JP) | 2026-03-10 | — | — | US | disclosed |
| EP-4700824-A1 | LOW-TEMPERATURE-SINTERING BONDING MATERIAL AND BONDED STRUCTURE | Daicel Corporation (JP) | 2026-02-25 | — | — | EP | disclosed |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | CENTRAL GLASS CO LTD (JP) | 2026-01-15 | — | — | US | disclosed |
| EP-0768573-A1 | Phosphor-containing photosensitive resin composition for use in manufacturing plasma display panel | Hitachi Chemical Co., Ltd. (JP) | 1997-04-16 | — | — | EP | disclosed |
| US-4863835-A | UNSATURATED POLYESTER, BENZYL ALCOHOL, TETRAHYDROFURFURYL ALCOHOL, ACID | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1989-09-05 | — | — | US | disclosed |
| EP-0037179-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES, A METHOD OF PLATE DEVELOPMENT, AND DEVELOPED PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1985-05-29 | — | — | EP | disclosed |
| EP-0013006-B1 | DEVELOPER COMPOSITION FOR LITHOGRAPHIC PRINTING PLATES | MITSUBISHI KASEI CORPORATION (JP) | 1983-06-22 | — | — | EP | disclosed |
| EP-0037179-A2 | Developer composition for lithographic printing plates, a method of plate development, and developed plates | MITSUBISHI KASEI CORPORATION (JP) | 1981-10-07 | — | — | EP | disclosed |
| US-4271261-A | PHOTOSENSITIVE POLYMER | MITSUBISHI CHEMICAL INDUSTRIES LIMITED (JP) | 1981-06-02 | — | — | US | disclosed |
| EP-0013006-A1 | Developer composition for lithographic printing plates | MITSUBISHI KASEI CORPORATION (JP) | 1980-07-09 | — | — | EP | disclosed |
| US-4186122-A | POLYESTER-AMIDE-IMIDE COPOLYMERS | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1980-01-29 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12588446-B2 | Surface treatment composition and method for producing wafer | SGMS1, SGMS2, SMURF1 | ALDH1A1 2890/4885TSHR 2614/4885HSD17B10 2560/4885 |
| US-12570865-B2 | Active energy ray-curable inkjet printing ink composition | ACP1, HPD, ACVRL1 | ALDH1A1 351/4885TSHR 4474/4885HSD17B10 457/4885 |
| US-20260018421-A1 | SUBSTRATE PROCESSING METHOD, AND SUBSTRATE MANUFACTURING METHOD | ESPL1, SMS, SGMS1 | ALDH1A1 1476/4885TSHR 2961/4885HSD17B10 2470/4885 |
| US-20260125594-A1 | QUANTUM DOT-CONTAINING COMPOSITION AND METHOD FOR PRODUCING THE SAME | ITGA6, STRA6, ILK | ALDH1A1 1562/4885TSHR 1369/4885HSD17B10 4330/4885 |
| US-12630727-B2 | Photocurable inkjet printing ink composition | OR10J3, TAS2R20, ILK | ALDH1A1 41/4885TSHR 2979/4885HSD17B10 277/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.