SCHEMBL359610

SCHEMBL359610

O=C1c2ccccc2Cc2ccc(-c3ccccc3)c(-c3ccccc3)c21

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAOA P21397 2/20 0.55
▸ CES1 P23141 2/20 0.47
▸ BCHE P06276 1/20 0.47
▸ MIF P14174 1/20 0.42
▸ MAOB P27338 1/20 0.42
▸ SRD5A2 P31213 1/20 0.42
▸ ALDH1A1 P00352 4/20 0.41
▸ CYP1A2 P05177 1/20 0.41
▸ CYP2C19 P33261 1/20 0.41
▸ ACHE P22303 1/20 0.40
▸ BACE1 P56817 1/20 0.40
▸ KDM4E B2RXH2 3/20 0.40
▸ MAPT P10636 2/20 0.40
▸ NPC1 O15118 1/20 0.40
▸ LMNA P02545 1/20 0.40
▸ HPGD P15428 1/20 0.40
▸ RAB9A P51151 1/20 0.40
▸ SMN1; SMN2 Q16637 1/20 0.40
▸ CYP19A1 P11511 2/20 0.39
▸ TNF P01375 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3271360 0.88 MAOA (0.61) MAOACES1BCHEMIFMAOB
SCHEMBL9395424 0.88 MAOA (0.49) MAOACES1BCHEMIFMAOB
SCHEMBL28721340 0.84 MAOA (0.52) MAOACES1BCHEMIFMAOB
SCHEMBL28378401 0.83 MAOA (0.39) MAOACES1BCHEMIFMAOB
SCHEMBL28169734 0.81 ALDH1A1 (0.41) MAOACES1BCHESRD5A2ALDH1A1
SCHEMBL27694768 0.79 MAOA (0.64) MAOACES1BCHEMIFMAOB
Anthrone SCHEMBL27997415 0.78 MAOA (0.82) MAOACES1BCHEMIFMAOB
SCHEMBL769934 0.76 MAOA (0.71) MAOACES1BCHEMIFMAOB
SCHEMBL313560 0.76 MAOA (0.46) MAOACES1BCHESRD5A2ALDH1A1
SCHEMBL1527421 0.76 MAOA (0.64) MAOACES1BCHEMIFMAOB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111007699-B Photosensitive resin and preparation method and application thereof 阜阳欣奕华材料科技有限公司 2023-07-14 — — CN claimed
CN-111007699-A Photosensitive resin and preparation method and application thereof 阜阳欣奕华材料科技有限公司 2020-04-14 — — CN claimed
CN-108250129-A compound with diaryl anthrone as core and application thereof in organic electroluminescent device 江苏三月光电科技有限公司 2018-07-06 — — CN claimed
CN-111007699-B Photosensitive resin and preparation method and application thereof 阜阳欣奕华材料科技有限公司 2023-07-14 — — CN disclosed
CN-116376000-A High-refraction polymer, preparation method and application 万华化学集团股份有限公司 2023-07-04 — — CN disclosed
CN-107840834-B Benzopyrene compound and application thereof 北京鼎材科技有限公司 2022-10-04 — — CN disclosed
CN-111007699-A Photosensitive resin and preparation method and application thereof 阜阳欣奕华材料科技有限公司 2020-04-14 — — CN disclosed
CN-108250129-A compound with diaryl anthrone as core and application thereof in organic electroluminescent device 江苏三月光电科技有限公司 2018-07-06 — — CN disclosed
CN-107840834-A A kind of benzopyrenes compound and application 北京鼎材科技有限公司 2018-03-27 — — CN disclosed
WO-2012008557-A1 NOVEL SPIRO (ANTHRACENE-9,9'-FLUOREN) -10-ONE COMPOUND AND ORGANIC LIGHT-EMITTING DEVICE INCLUDING THE SAME CANON KABUSHIKI KAISHA (JP) 2012-01-19 — — WO disclosed
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