SCHEMBL360079

SCHEMBL360079

OCC1C=CC=CC1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12630655 1.00
SCHEMBL28310483 1.00
SCHEMBL10517267 0.83
SCHEMBL7067973 0.80
SCHEMBL13957201 0.77 SIGMAR1 (0.31)
SCHEMBL3436917 0.76
SCHEMBL24488710 0.74
SCHEMBL724119 0.74
SCHEMBL18408650 0.74
SCHEMBL13892566 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 79 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118001879-A Application of nano copper alloy in filtering harmful substances in cigarette smoke 广东合一新材料研究院有限公司 2024-05-10 CN claimed
CN-101573341-A Imidazolidinone Kv1.5 potassium channel inhibitors WYETH CORP (US) 2009-11-04 CN claimed
EP-0667331-B1 Process for the preparation of hydroxybenzaldehydes RHODIA CHIMIE SA (FR) 1999-12-08 EP claimed
EP-0058100-B1 PROCESS FOR PREPARING HYDROXYBENZALDEHYDES SOCIETE FRANCAISE HOECHST Société anonyme dite: (FR) 1984-12-27 EP claimed
CN-118001879-A Application of nano copper alloy in filtering harmful substances in cigarette smoke 广东合一新材料研究院有限公司 2024-05-10 CN disclosed
CN-112218631-B Heterocyclic inhibitors of ATR kinase 德州大学系统董事会 2023-12-22 CN disclosed
EP-4230060-A1 SMOKING PRODUCT CONTAINING NOVEL FLAVORING AGENT KT & G Corporation (KR) 2023-08-23 EP disclosed
CN-116194845-A Photomask, exposure method, method for producing resin pattern, and method for producing photomask 富士胶片株式会社 2023-05-30 CN disclosed
CN-116149141-A Method for producing resin pattern, method for producing conductive pattern, and laminate 富士胶片株式会社 2023-05-23 CN disclosed
CN-116149136-A Photosensitive composition, laminate, pattern forming method, and patterned laminate 富士胶片株式会社 2023-05-23 CN disclosed
CN-116149134-A Method for producing resin pattern, method for producing conductive pattern, and laminate 富士胶片株式会社 2023-05-23 CN disclosed
CN-110183431-B Compound for treating or preventing liver diseases 江苏新元素医药科技有限公司 2023-04-11 CN disclosed
WO-2003043402-A2 NUCLEIC ACID PROBES AND METHODS TO DETECT AND/OR QUANTIFY NUCLEIC ACID ANALYTES PROLIGO LLC (US) 2003-05-30 WO disclosed
EP-1287404-A1 METHOD FOR IMMOBILIZING OLIGONUCLEOTIDES EMPLOYING THE CYCLOADDITION BIOCONJUGATION METHOD Proligo LLC (US) 2003-03-05 EP disclosed
CN-1335845-A 3,4-dihydro-2H-benzo[1,4] oxazinyl-methyl [3-(1H-indol-3-yl)-alkyl]-amines AMERICAN HOME PROD (US) 2002-02-13 CN disclosed
WO-2001084234-A1 METHOD FOR IMMOBILIZING OLIGONUCLEOTIDES EMPLOYING THE CYCLOADDITION BIOCONJUGATION METHOD PROLIGO LLC (US) 2001-11-08 WO disclosed
CN-1304409-A Indol-3-Yl-cyclohexyl amide derivatives for treatment of depression (5-HT1 receptor antagonists) AMERICAN HOME PROD (US) 2001-07-18 CN disclosed
CN-1202152-A Novel 4- (oxoxyphenyl) -3-oxopiperidines for the treatment of cardiac and renal insufficiency HOFFMANN LA ROCHE (CH) 1998-12-16 CN disclosed
EP-0110252-A2 Heat-sensitive registration material BASF Aktiengesellschaft (DE) 1984-06-13 EP disclosed
US-4098881-A COMPOSITIONS TO CONTROL THE CHRONIC EFFECTS OF EXPOSURE TO SUNLIGHT COMPRISING CONJUGATED DIENES THE PROCTER & GAMBLE COMPANY (US) 1978-07-04 US disclosed