⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13957201 | 0.86 | SIGMAR1 (0.31) | — | |
| SCHEMBL13532276 | 0.85 | — | — | |
| SCHEMBL29465826 | 0.83 | LMNA (0.31) | — | |
| SCHEMBL28310483 | 0.80 | — | — | |
| SCHEMBL360079 | 0.80 | — | — | |
| SCHEMBL12630655 | 0.80 | — | — | |
| SCHEMBL9286912 | 0.78 | — | — | |
| SCHEMBL14793045 | 0.76 | — | — | |
| SCHEMBL8348000 | 0.76 | — | — | |
| SCHEMBL14535983 | 0.76 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | claimed |
| CN-107635990-A | Derivative, pharmaceutical composition and the application method of new 3 indoles substitution | 辉瑞公司 | 2018-01-26 | — | — | CN | disclosed |
| EP-2261235-A2 | Inhibitors of caspases | VERTEX PHARMACEUTICALS INCORPORATED (US) | 2010-12-15 | — | — | EP | disclosed |
| EP-2103623-A2 | Novel macrocyclic inhibitors of Hepatitis C virus replication | Intermune, Inc. (US) | 2009-09-23 | — | — | EP | disclosed |
| EP-0980696-B1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL CO (JP) | 2003-11-26 | — | — | EP | disclosed |
| US-6197226-B1 | COMPRISING DIPPING RESIN INTO A LIQUID CONTAINING POLAR COMPOUND SELECTED FROM POLAR INORGANIC COMPOUNDS AND POLAR ORGANIC COMPOUNDS AND TINTING RESIN, WHEREIN RESIN IS OBTAINED BY CURING BY POLYMERIZATION A SULFUR CONTAINING COMPOUND | MITSUBISHI GAS CHEMICAL COMPANY (JP) | 2001-03-06 | — | — | US | disclosed |
| US-6180753-B1 | ADDING ACIDS, CURING AND SOLIDIFICATION WITH CASTING | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2001-01-30 | — | — | US | disclosed |
| EP-0980696-A1 | Process for treating a compound having epithio structures for disposal | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2000-02-23 | — | — | EP | disclosed |
| EP-0928802-A2 | Process for tinting a resin having a large refractivity index and optical material tinted by the process | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 1999-07-14 | — | — | EP | disclosed |
| US-5763444-A | CENTRAL NERVOUS SYSTEM AGENTS | BRISTOL-MYERS SQUIBB COMPANY (US) | 1998-06-09 | — | — | US | disclosed |