Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | L3MBTL1 | Q9Y468 | 4/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.55 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.55 |
| ▸ | THRB | P10828 | 1/20 | 0.55 |
| ▸ | XDH | P47989 | 1/20 | 0.53 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.51 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | PPARG | P37231 | 1/20 | 0.50 |
| ▸ | PPARA | Q07869 | 1/20 | 0.50 |
| ▸ | MEN1 | O00255 | 1/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.48 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.47 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.47 |
| ▸ | PLAU | P00749 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 3/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.46 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.46 |
| ▸ | GRIN1 | Q05586 | 1/20 | 0.46 |
| ▸ | GRIN2B | Q13224 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31667880 | 1.00 | L3MBTL1 (0.55) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL11963967 | 1.00 | L3MBTL1 (0.55) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL31667879 | 1.00 | L3MBTL1 (0.55) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL11963984 | 0.92 | ALDH1A1 (0.48) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL12726824 | 0.91 | L3MBTL1 (0.61) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL12715742 | 0.86 | PPARG (0.54) | SMN1; SMN2ALDH1A1PPARGPPARAMEN1 | |
| SCHEMBL11963949 | 0.85 | PPARG (0.50) | SMN1; SMN2ALDH1A1PPARGPPARAMEN1 | |
| SCHEMBL1357968 | 0.84 | L3MBTL1 (0.60) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL1507583 | 0.84 | L3MBTL1 (0.60) | L3MBTL1SMN1; SMN2TDP1THRBXDH | |
| SCHEMBL11963961 | 0.84 | L3MBTL1 (0.60) | L3MBTL1SMN1; SMN2TDP1THRBXDH |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | claimed |
| US-20100080973-A1 | LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2010-04-01 | — | — | US | claimed |
| WO-2008035890-A9 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEMICAL LTD (KR) | 2009-04-23 | — | — | WO | claimed |
| WO-2008035890-A1 | AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2008-03-27 | — | — | WO | claimed |
| US-6743572-B2 | OVERCOATING WITH ZONES OF FILM FORMING POLYMER; HEATING PHOTORESISTS; DEVELOPMENT | INFINEON TECHNOLOGIES AG (DE) | 2004-06-01 | — | — | US | claimed |
| US-20020187436-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-12-12 | — | — | US | claimed |
| EP-3374467-B1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC TECH AG (CH) | 2020-04-15 | — | — | EP | disclosed |
| US-20180320072-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | Rolic Technologies AG (CH) | 2018-11-08 | — | — | US | disclosed |
| EP-3374467-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC Technologies AG (CH) | 2018-09-19 | — | — | EP | disclosed |
| WO-2017080977-A1 | COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS | ROLIC AG (CH) | 2017-05-18 | — | — | WO | disclosed |
| US-20130126860-A1 | THIN FILM TRANSISTOR SUBSTRATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-05-23 | — | — | US | disclosed |
| US-20130126860-A1 | THIN FILM TRANSISTOR SUBSTRATE | DAI NIPPON PRINTING CO., LTD. (JP) | 2013-05-23 | — | — | US | disclosed |
| US-8367190-B2 | At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same | LG CHEM, LTD. (KR) | 2013-02-05 | — | — | US | disclosed |
| US-7572555-B2 | Hologram recording material, hologram recording method and optical recording medium | FUJIFILM CORPORATION (JP) | 2009-08-11 | — | — | US | disclosed |
| US-7531667-B2 | Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-7531667-B2 | Two-photon absorption dye-containing material, three-dimensional refractive index modulation material, three-dimensional absorption index modulation material and three-dimensional optical recording material | FUJIFILM CORPORATION (JP) | 2009-05-12 | — | — | US | disclosed |
| US-20070207390-A1 | Hologram recording material and hologram recording method | FUJIFILM CORPORATION (JP) | 2007-09-06 | — | — | US | disclosed |
| US-20070207390-A1 | Hologram recording material and hologram recording method | FUJIFILM CORPORATION (JP) | 2007-09-06 | — | — | US | disclosed |
| US-6743572-B2 | OVERCOATING WITH ZONES OF FILM FORMING POLYMER; HEATING PHOTORESISTS; DEVELOPMENT | INFINEON TECHNOLOGIES AG (DE) | 2004-06-01 | — | — | US | disclosed |
| US-20020187436-A1 | Method for structuring a photoresist layer | POLARIS INNOVATIONS LIMITED (IE) | 2002-12-12 | — | — | US | disclosed |