SCHEMBL3612596

SCHEMBL3612596

CCCCCCCC(N)C(=O)OCc1ccccc1[N+](=O)[O-]

nearest known ligand 0.46

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.46
MAOB P27338 1/20 0.44
KMT2A Q03164 4/20 0.43
MEN1 O00255 2/20 0.43
HPGD P15428 2/20 0.41
GAA P10253 1/20 0.41
TP53 P04637 2/20 0.41
POLB P06746 1/20 0.41
CYP2C19 P33261 1/20 0.41
PRSS1 P07477 1/20 0.41
PRSS2 P07478 1/20 0.41
PRSS3 P35030 1/20 0.41
LMNA P02545 1/20 0.40
HSP90AA1 P07900 1/20 0.40
ATM Q13315 1/20 0.40
ALDH1A1 P00352 1/20 0.40
HTT P42858 1/20 0.40
ESR1 P03372 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1053905 0.99 MAOB (0.45) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL910460 0.89 MAOB (0.43) L3MBTL1MAOBKMT2AMEN1POLB
SCHEMBL29175065 0.88 MAOB (0.43) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL29674293 0.86 L3MBTL1 (0.57) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL1056790 0.85 L3MBTL1 (0.42) L3MBTL1KMT2AMEN1HPGDGAA
SCHEMBL1057910 0.85 KMT2A (0.51) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL18233964 0.81 L3MBTL1 (0.43) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL18233940 0.81 L3MBTL1 (0.43) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL18233939 0.81 L3MBTL1 (0.43) L3MBTL1MAOBKMT2AMEN1HPGD
SCHEMBL18233942 0.81 L3MBTL1 (0.43) L3MBTL1MAOBKMT2AMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US claimed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US claimed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO claimed
EP-3374467-B1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC TECH AG (CH) 2020-04-15 EP disclosed
US-20180320072-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS Rolic Technologies AG (CH) 2018-11-08 US disclosed
EP-3374467-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC Technologies AG (CH) 2018-09-19 EP disclosed
WO-2017080977-A1 COMPOSITIONS OF PHOTO-ALIGNABLE MATERIALS ROLIC AG (CH) 2017-05-18 WO disclosed
US-8367190-B2 At low temperature, fast hardening composition for preparing protecting film, protecting film prepared therefrom, and substrate comprising the same LG CHEM, LTD. (KR) 2013-02-05 US disclosed
US-20100080973-A1 LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2010-04-01 US disclosed
WO-2008035890-A1 AT LOW TEMPERATURE, FAST HARDENING COMPOSITION FOR PREPARING PROTECTING FILM, PROTECTING FILM PREPARED THEREFROM, AND SUBSTRATE COMPRISING THE SAME LG CHEM, LTD. (KR) 2008-03-27 WO disclosed