SCHEMBL3617522

SCHEMBL3617522

CCCCC1(c2ccncc2)C=CC=CC1

nearest known ligand 0.41

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 20/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29173302 0.84 CYP19A1 (0.36) CYP19A1
SCHEMBL27477350 0.79 KCNH2 (0.34)
SCHEMBL27989572 0.77 CYP19A1 (0.46) CYP19A1
SCHEMBL12611020 0.74 PGR (0.39) CYP19A1
SCHEMBL28237893 0.74 OPRM1 (0.33)
Cyclohexylamine SCHEMBL11661557 0.73 BACE1 (0.34)
SCHEMBL8583524 0.72 CYP19A1 (0.40) CYP19A1
SCHEMBL6276479 0.72 ESR1 (0.32)
SCHEMBL29818664 0.68
SCHEMBL27330211 0.68 TSHR (0.37)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9410951-B2 Method for producing substrate for making microarray SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-09 US disclosed
CN-103176353-A Chemically amplified negative resist composition and patterning process SHINETSU CHEMICAL CO 2013-06-26 CN disclosed
US-20100055337-A1 Method for producing substrate for making microarray SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-03-04 US disclosed
CN-101387831-A Chemically amplified negative resist composition and pattern forming method SHINETSU CHEMICAL CO (JP) 2009-03-18 CN disclosed