Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 1/20 | 0.36 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.32 |
| ▸ | DNM1 | Q05193 | 2/20 | 0.31 |
| ▸ | SMPD1 | P17405 | 3/20 | 0.31 |
| ▸ | ZDHHC7 | Q9NXF8 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29057372 | 1.00 | MAPT (0.36) | MAPTOPRM1LMNADNM1SMPD1 | |
| SCHEMBL4853607 | 1.00 | MAPT (0.36) | MAPTOPRM1LMNADNM1SMPD1 | |
| SCHEMBL15261078 | 0.98 | OPRM1 (0.35) | MAPTOPRM1 | |
| SCHEMBL143059 | 0.93 | MAPT (0.36) | MAPTOPRM1LMNADNM1SMPD1 | |
| SCHEMBL29057373 | 0.85 | — | — | |
| SCHEMBL4853955 | 0.83 | LMNA (0.46) | MAPTOPRM1LMNADNM1SMPD1 | |
| Tridecane SCHEMBL3629304 | 0.83 | LMNA (0.46) | MAPTOPRM1LMNADNM1SMPD1 | |
| SCHEMBL12199856 | 0.81 | LMNA (0.43) | OPRM1LMNADNM1SMPD1ZDHHC7 | |
| SCHEMBL29116551 | 0.78 | OPRM1 (0.43) | MAPTOPRM1LMNASMPD1 | |
| SCHEMBL28209084 | 0.78 | OPRM1 (0.43) | MAPTOPRM1LMNASMPD1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7678411-B2 | Method of forming wiring pattern and method of forming gate electrode for TFT | SEIKO EPSON CORPORATION (JP) | 2010-03-16 | — | — | US | disclosed |
| US-7300132-B2 | Pattern forming method, method of manufacturing electronic apparatus, and method of manufacturing substrate | SEIKO EPSON CORPORATION (JP) | 2007-11-27 | — | — | US | disclosed |
| EP-1710616-B1 | Liquid crystal device and electronic apparatus | SEIKO EPSON CORP (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20070139588-A1 | COLOR FILTER SUBSTRATE, LIQUID CRYSTAL DISPLAY DEVICE, ELECTRONIC APPARATUS, AND METHODS FOR MANUFACTURING COLOR FILTER SUBSTRATE AND LIQUID CRYSTAL DISPLAY DEVICE | SEIKO EPSON CORPORATION (JP) | 2007-06-21 | — | — | US | disclosed |
| US-20060227264-A1 | Liquid crystal device and electronic apparatus | SEIKO EPSON CORPORATION | 2006-10-12 | — | — | US | disclosed |
| EP-1710616-A1 | Liquid crystal device and electronic apparatus | Seiko Epson Corporation (JP) | 2006-10-11 | — | — | EP | disclosed |
| US-20060055722-A1 | Pattern forming method, method of manufacturing electronic apparatus, and method of manufacturing substrate | SEIKO EPSON CORPORATION (JP) | 2006-03-16 | — | — | US | disclosed |
| US-20060045963-A1 | Method of forming wiring pattern and method of forming gate electrode for TFT | SEIKO EPSON CORPORATION (JP) | 2006-03-02 | — | — | US | disclosed |