⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2697004 | 0.87 | — | — | |
| SCHEMBL1378714 | 0.87 | — | — | |
| SCHEMBL36654 | 0.87 | — | — | |
| Ammonia Solution, Strong SCHEMBL25368540 | 0.87 | — | — | |
| SCHEMBL562096 | 0.87 | — | — | |
| SCHEMBL23039391 | 0.87 | — | — | |
| SCHEMBL19513938 | 0.87 | — | — | |
| SCHEMBL4812214 | 0.87 | — | — | |
| SCHEMBL20768711 | 0.87 | — | — | |
| SCHEMBL2058334 | 0.87 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 1333384 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6414269-B1 | — | — | None | — | — | US | claimed |
| US-6437455-B1 | — | — | None | — | — | US | claimed |
| US-6417114-B1 | — | — | None | — | — | US | claimed |
| US-9978870-B2 | FinFET with buried insulator layer and method for forming | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2018-05-22 | — | — | US | claimed |
| US-9978586-B2 | Method of material deposition | FEI COMPANY (US) | 2018-05-22 | — | — | US | claimed |
| US-9978790-B2 | Image sensor and method for manufacturing thereof | TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD. (TW) | 2018-05-22 | — | — | US | claimed |
| US-9977186-B2 | Semiconductor device and method of manufacturing the same | RENESAS ELECTRONICS CORPORATION (JP) | 2018-05-22 | — | — | US | claimed |
| US-9976214-B2 | Cleaning method and method of manufacturing semiconductor device | HITACHI KOKUSAI ELECTRIC INC. (JP) | 2018-05-22 | — | — | US | claimed |
| US-9978758-B1 | Flash memory cell | UNITED MICROELECTRONICS CORP. (TW) | 2018-05-22 | — | — | US | claimed |
| US-9978835-B2 | Semiconductor device including nanowire transistor | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2018-05-22 | — | — | US | claimed |
| US-3964941-A | Method of making isolated complementary monolithic insulated gate field effect transistors | MOTOROLA, INC. (US) | 1976-06-22 | — | — | US | claimed |
| US-3963524-A | Method of producing a semiconductor device | SIEMENS AKTIENGESELLSCHAFT (DT) | 1976-06-15 | — | — | US | claimed |
| US-3960623-A | Membrane mask for selective semiconductor etching | GENERAL ELECTRIC COMPANY (US) | 1976-06-01 | — | — | US | claimed |
| US-3959543-A | Non-linear resistance surge arrester disc collar and glass composition thereof | GENERAL ELECTRIC COMPANY | 1976-05-25 | — | — | US | claimed |
| US-3947299-A | Method of manufacturing semiconductor devices | U.S. PHILIPS CORPORATION (US) | 1976-03-30 | — | — | US | claimed |
| US-3943621-A | Semiconductor device and method of manufacture therefor | GENERAL ELECTRIC COMPANY (US) | 1976-03-16 | — | — | US | claimed |
| US-3943015-A | MONOCRYSTALLINE SILICON | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 1976-03-09 | — | — | US | claimed |
| US-3943014-A | Process for the fabrication of silicon transistors with high DC current gain | SANKEN ELECTRIC COMPANY LIMITED (JA) | 1976-03-09 | — | — | US | claimed |
| US-3941903-A | Wear-resistant bearing material and a process for making it | UNION CARBIDE CORPORATION (US) | 1976-03-02 | — | — | US | claimed |
| US-3935033-A | Method of improving the radiation resistance of silicon transistors with a silicon oxide coating | SIEMENS AKTIENGESELLSCHAFT (DT) | 1976-01-27 | — | — | US | claimed |