Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES1 | P23141 | 2/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 3/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.36 |
| ▸ | KAT6A | Q92794 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
| ▸ | CA5A | P35218 | 1/20 | 0.36 |
| ▸ | CA9 | Q16790 | 1/20 | 0.36 |
| ▸ | SRC | P12931 | 1/20 | 0.36 |
| ▸ | MLYCD | O95822 | 1/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | CES2 | O00748 | 1/20 | 0.34 |
| ▸ | ACHE | P22303 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | PDPK1 | O15530 | 1/20 | 0.34 |
| ▸ | GLS | O94925 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11057570 | 0.87 | CES1 (0.45) | CES1HSD11B1SRCRAB9ALMNA | |
| SCHEMBL36374 | 0.87 | CES1 (0.48) | CES1PTPN1CA1CA2CA5A | |
| SCHEMBL21874985 | 0.86 | CES1 (0.39) | CES1PTPN1HSD11B1KAT6ACA1 | |
| Trifluoromethylbenzene SCHEMBL28170271 | 0.85 | CES1 (0.50) | CES1PTPN1HSD11B1RAB9ALMNA | |
| SCHEMBL27612829 | 0.84 | SMN1; SMN2 (0.50) | CES1HSD11B1KAT6ASRCRAB9A | |
| SCHEMBL452944 | 0.82 | HSD11B1 (0.40) | CES1HSD11B1KAT6ARAB9A | |
| Methoxymethane SCHEMBL36098 | 0.80 | CES1 (0.56) | CES1SRCLMNACES2MAPK1 | |
| SCHEMBL504244 | 0.79 | RECQL (0.47) | CES1HSD11B1RAB9ALMNACES2 | |
| SCHEMBL8768398 | 0.78 | CES1 (0.41) | CES1PTPN1SRCRAB9ALMNA | |
| Trifluoromethanesulfonic Acid SCHEMBL9626708 | 0.78 | CES1 (0.48) | CES1PTPN1HSD11B1KAT6ACA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 29 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11592605-B2 | Color developing structure having concave-convex layer, method for producing such structure, and display | TOPPAN PRINTING CO., LTD. (JP) | 2023-02-28 | — | — | US | disclosed |
| CN-114975098-A | Nanoimprint liquid material, method for producing pattern of cured product, and method for producing circuit board | 佳能株式会社 | 2022-08-30 | — | — | CN | disclosed |
| CN-107251193-B | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2022-06-21 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| CN-104662049-B | Photocurable composition and method for producing film using same | 佳能株式会社 | 2020-06-02 | — | — | CN | disclosed |
| EP-3647835-A1 | COLORING STRUCTURE, DISPLAY BODY, AND METHOD FOR MANUFACTURING COLORING STRUCTURE | Toppan Printing Co., Ltd. (JP) | 2020-05-06 | — | — | EP | disclosed |
| US-20200132900-A1 | COLOR DEVELOPING STRUCTURE, DISPLAY, AND METHOD FOR PRODUCING COLOR DEVELOPING STRUCTURE | TOPPAN PRINTING CO., LTD. (JP) | 2020-04-30 | — | — | US | disclosed |
| CN-110998437-A | Multi-trigger photoresist compositions and methods | A·P·G·罗宾森 | 2020-04-10 | — | — | CN | disclosed |
| CN-110799861-A | Color developing structure, display body, and method for producing color developing structure | 凸版印刷株式会社 | 2020-02-14 | — | — | CN | disclosed |
| CN-107251193-A | Nanoimprint liquid material, method for producing pattern of cured product, method for producing optical component, and method for producing circuit board | 佳能株式会社 | 2017-10-13 | — | — | CN | disclosed |
| CN-101154041-A | Radiation sensitive resin composition, and formation of interlayer insulating film and microlens | JSR CORP (JP) | 2008-04-02 | — | — | CN | disclosed |
| CN-1245664-C | Radiation-sensitive composition changing in refractive index and method of changing refractive index | JSR CORP (JP) | 2006-03-15 | — | — | CN | disclosed |
| EP-0901043-B1 | Radiation-sensitive resin composition | JSR CORP (JP) | 2004-10-27 | — | — | EP | disclosed |
| EP-0959389-B1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| EP-0843220-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2003-02-19 | — | — | EP | disclosed |
| US-6143460-A | PHOTOACID GENERATOR PROVIDING IMPROVED PHOTORESIST RESOLUTION | JSR CORPORATION (JP) | 2000-11-07 | — | — | US | disclosed |
| US-6120972-A | COPOLYMER OF ACRYLIC ESTER AND CARBONATE WITH PHOTOACID GENERATOR FOR PHOTOSENSITIVE ELEMENTS | JSR CORPORATION (JP) | 2000-09-19 | — | — | US | disclosed |
| EP-0959389-A1 | Diazodisulfone compound and radiation-sensitive resin composition | JSR Corporation (JP) | 1999-11-24 | — | — | EP | disclosed |
| EP-0901043-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 1999-03-10 | — | — | EP | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |