Methacrylic Acid

Methacrylic Acid

SCHEMBL36396

C=C(C)C(=O)O.CCC(CO)(CO)COC(=O)c1ccccc1

nearest known ligand 0.59

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.59
HIF1A Q16665 1/20 0.59
TDP1 Q9NUW8 3/20 0.47
SLC6A3 Q01959 2/20 0.47
CYP2D6 P10635 2/20 0.47
HTR1A P08908 1/20 0.47
SCN1A P35498 1/20 0.47
SCN5A Q14524 1/20 0.47
SCN2A Q99250 1/20 0.47
SCN3A Q9NY46 1/20 0.47
LMNA P02545 1/20 0.46
ALDH1A1 P00352 3/20 0.41
KMT2A Q03164 3/20 0.41
TSHR P16473 2/20 0.41
SLC6A2 P23975 1/20 0.41
MAPT P10636 1/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
NPC1 O15118 2/20 0.39
RAB9A P51151 2/20 0.39
CYP1A2 P05177 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL505769 0.91 MAPK1 (0.71) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL644017 0.89 MAPK1 (0.56) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL11436193 0.88 MAPK1 (0.71) MAPK1HIF1ATDP1SLC6A3CYP2D6
Acrylic Acid SCHEMBL57609 0.86 MAPK1 (0.59) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL9172153 0.86 MAPK1 (0.63) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL235921 0.85 MAPK1 (0.81) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL2140682 0.84 MAPK1 (0.61) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL3410019 0.84 MAPK1 (0.61) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL6906425 0.83 MAPK1 (0.56) MAPK1HIF1ATDP1SLC6A3CYP2D6
SCHEMBL1786754 0.83 MAPK1 (0.79) MAPK1HIF1ATDP1SLC6A3CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4003743-A1 PRINTED MATTER PRODUCING METHOD AND PRINTED MATTER PRODUCING APPARATUS, AND PRINTED MATTER Ricoh Company, Ltd. (JP) 2022-06-01 EP disclosed
EP-3232268-B1 SOLDER RESIST COMPOSITION AND COVERED PRINTED WIRING BOARD GOO CHEMICAL CO LTD (JP) 2019-05-08 EP disclosed
US-9982152-B2 Active energy ray curable composition, cured product, composition storage container, two-dimensional or three-dimensional image forming apparatus, and two-dimensional or three-dimensional image forming method RICOH COMPANY, LTD. (JP) 2018-05-29 US disclosed
US-20170327705-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, CURED PRODUCT, COMPOSITION STORAGE CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, AND TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD RICOH COMPANY, LTD. (JP) 2017-11-16 US disclosed
EP-3243845-A1 ACTIVE ENERGY RAY CURABLE COMPOSITION, CURED PRODUCT, COMPOSITION STORAGE CONTAINER, TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING APPARATUS, AND TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGE FORMING METHOD Ricoh Company, Ltd. (JP) 2017-11-15 EP disclosed
US-9428665-B2 Photopolymerizable inkjet ink, ink cartridge, and inkjet recording device RICOH COMPANY, LTD. (JP) 2016-08-30 US disclosed
EP-2487213-B1 CONDUCTIVE COATING FILM-FORMING AGENT, PRODUCTION METHOD FOR SAME, AND MOLDED ARTICLE USING SAME MITSUBISHI MAT ELECT CHEM CO (JP) 2016-04-20 EP disclosed
US-9138779-B2 Multilayer coat and method for producing the same DAI NIPPON TORYO CO., LTD. (JP) 2015-09-22 US disclosed
US-20150234113-A1 OPTICAL WAVEGUIDE SHEET, BACKLIGHT UNIT, AND PORTABLE TERMINAL KEIWA INC. (JP) 2015-08-20 US disclosed
US-9109136-B2 2015-08-18 US disclosed
US-20120193587-A1 CONDUCTIVE COATING FILM-FORMING AGENT, METHOD FOR PRODUCING THE SAME, AND MOLDED ARTICLE USING THE SAME MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO., LTD (JP) 2012-08-02 US disclosed
US-20110275016-A1 ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE ASAHI KASEI E-MATERIALS CORPORATION (JP) 2011-11-10 US disclosed
EP-2381309-A1 ABLATION LAYER, PHOTOSENSITIVE RESIN STRUCTURE, AND METHOD FOR PRODUCING RELIEF PRINTING PLATE USING THE PHOTOSENSITIVE RESIN STRUCTURE Asahi Kasei E-materials Corporation (JP) 2011-10-26 EP disclosed
US-20110230582-A1 ENERGY BEAM-CURING INKJET INK COMPOSITION MAXELL SLIONTEC LTD. (JP) 2011-09-22 US disclosed
EP-2351799-A1 ENERGY BEAM-CURING INKJET INK COMPOSITION Maxell Sliontec Ltd. (JP) 2011-08-03 EP disclosed
US-20110028586-A1 ENERGY RAY-CURABLE INKJET INK COMPOSITION HITACHI MAXELL, LTD. (JP) 2011-02-03 US disclosed
EP-2277956-A1 ENERGY RAY-CURABLE INKJET INK COMPOSITION Hitachi Maxell, Ltd. (JP) 2011-01-26 EP disclosed
US-7599133-B2 Optical part for camera and method of fabricating the same SANYO ELECTRIC CO., LTD. (JP) 2009-10-06 US disclosed
US-20080204898-A1 OPTICAL PART FOR CAMERA AND METHOD OF FABRICATING THE SAME SANYO ELECTRIC CO., LTD. (JP) 2008-08-28 US disclosed
US-20070160933-A1 Water-developable photopolymer plate for letterpress printing ASAHI KASEI CHEMICALS CORPORATION (JP) 2007-07-12 US disclosed