Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 1/20 | 0.56 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.56 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.45 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.45 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.45 |
| ▸ | HTR1A | P08908 | 1/20 | 0.45 |
| ▸ | SCN1A | P35498 | 1/20 | 0.45 |
| ▸ | SCN5A | Q14524 | 1/20 | 0.45 |
| ▸ | SCN2A | Q99250 | 1/20 | 0.45 |
| ▸ | SCN3A | Q9NY46 | 1/20 | 0.45 |
| ▸ | LMNA | P02545 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | ELANE | P08246 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.39 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.39 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.37 |
| ▸ | RAB9A | P51151 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9172153 | 0.95 | MAPK1 (0.63) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL14446452 | 0.93 | MAPK1 (0.45) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL2140682 | 0.93 | MAPK1 (0.61) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL3410019 | 0.93 | MAPK1 (0.61) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| Methacrylic Acid SCHEMBL36396 | 0.89 | MAPK1 (0.59) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL11436193 | 0.89 | MAPK1 (0.71) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| Benzoic Acid SCHEMBL2099291 | 0.88 | TDP1 (0.45) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL505769 | 0.86 | MAPK1 (0.71) | MAPK1HIF1ATDP1SLC6A3CYP2D6 | |
| SCHEMBL443709 | 0.83 | THRB (0.44) | MAPK1HIF1ATDP1ALDH1A1TSHR | |
| SCHEMBL235921 | 0.83 | MAPK1 (0.81) | MAPK1HIF1ATDP1SLC6A3CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20050042515-A1 | Composition for protecting negative electrode for lithium metal battery, and lithium metal battery fabricated using same | SAMSUNG SDI CO., LTD. (KR) | 2005-02-24 | — | — | US | claimed |
| EP-3330329-B1 | INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT | RICOH CO LTD (JP) | 2022-06-08 | — | — | EP | disclosed |
| US-10710374-B2 | Inkjet recording apparatus, printer, and method for manufacturing cured product | RICOH COMPANY, LTD. (JP) | 2020-07-14 | — | — | US | disclosed |
| US-10611920-B2 | Curable composition, curable ink, method for forming two-dimensional or three-dimensional images, apparatus for forming two-dimensional or three-dimensional images, cured product, structural body, and processed product | RICOH COMPANY, LTD. (JP) | 2020-04-07 | — | — | US | disclosed |
| US-20200086652-A1 | INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT | IIO MASATO (JP) | 2020-03-19 | — | — | US | disclosed |
| US-10538099-B2 | Inkjet recording apparatus, printer, and method for manufacturing cured product | RICOH COMPANY, LTD. (JP) | 2020-01-21 | — | — | US | disclosed |
| US-10227497-B2 | Active energy ray curable composition, active energy ray curable ink, inkjet ink, stereoscopic modeling material, active energy ray curable composition container, two-dimensional or three dimensional image forming apparatus, two-dimensional or three-dimensional image forming method, cured product, and processed product | RICOH COMPANY, LTD. (JP) | 2019-03-12 | — | — | US | disclosed |
| US-20180154657-A1 | INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT | RICOH COMPANY, LTD. (JP) | 2018-06-07 | — | — | US | disclosed |
| EP-3330329-A2 | INKJET RECORDING APPARATUS, PRINTER, AND METHOD FOR MANUFACTURING CURED PRODUCT | Ricoh Company Ltd. (JP) | 2018-06-06 | — | — | EP | disclosed |
| US-20180016454-A1 | CURABLE COMPOSITION, CURABLE INK, METHOD FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGES, APPARATUS FOR FORMING TWO-DIMENSIONAL OR THREE-DIMENSIONAL IMAGES, CURED PRODUCT, STRUCTURAL BODY, AND PROCESSED PRODUCT | RICOH COMPANY, LTD. (JP) | 2018-01-18 | — | — | US | disclosed |
| US-20110237703-A1 | PROCESS FOR PRODUCING PHOTOCURABLE MATERIAL, PHOTOCURABLE MATERIAL AND ARTICLE | ASAHI GLASS COMPANY, LIMITED (JP) | 2011-09-29 | — | — | US | disclosed |
| US-20110227257-A1 | PHOTOCURABLE COMPOSITION AND PROCESS FOR PRODUCING MOLDED PRODUCT HAVING FINE PATTERN ON ITS SURFACE | ASAHI GLASS COMPANY, LIMITED (JP) | 2011-09-22 | — | — | US | disclosed |
| EP-2360195-A1 | PHOTO-CURING MATERIAL MANUFACTURING METHOD, AND PHOTO-CURING MATERIAL AND ARTICLE | Asahi Glass Company Limited (JP) | 2011-08-24 | — | — | EP | disclosed |
| EP-2357205-A1 | PHOTOCURABLE COMPOSITION AND METHOD FOR MANUFACTURING A MOLDED BODY HAVING A FINE SURFACE PATTERN | Asahi Glass Company Limited (JP) | 2011-08-17 | — | — | EP | disclosed |
| US-20090130453-A1 | Active energy ray-curable resin composition and laminate thereof | TDK CORPORATION (JP) | 2009-05-21 | — | — | US | disclosed |
| US-20080108760-A1 | Active Energy Curable Ink Composition for Multicoat Printing | MATSUI CHEMICAL CO., LTD. (JP) | 2008-05-08 | — | — | US | disclosed |
| EP-1762600-A1 | ACTINIC-ENERGY-RAY-CURABLE INK COMPOSITION FOR OVERPRINTING | Matsui Chemical Co., Ltd. (JP) | 2007-03-14 | — | — | EP | disclosed |
| US-7030258-B2 | Organometallic complex compound can under drying process by ultraviolet-light irradiation or heating; dehydration to remove water while preparing electroluminescent device; forming a cured thermosetting resin film, a transparent film, free of water spot | FUTABA CORPORATION (JP) | 2006-04-18 | — | — | US | disclosed |
| US-20050042515-A1 | Composition for protecting negative electrode for lithium metal battery, and lithium metal battery fabricated using same | SAMSUNG SDI CO., LTD. (KR) | 2005-02-24 | — | — | US | disclosed |
| US-20040256592-A1 | Organometallic complex compound can under drying process by ultraviolet-light irradiation or heating; dehydration to remove water while preparing electroluminescent device; forming a cured thermosetting resin film, a transparent film, free of water spot | FUTABA CORPORATION (JP) | 2004-12-23 | — | — | US | disclosed |