Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALOX15 | P16050 | 3/20 | 0.52 |
| ▸ | HTT | P42858 | 3/20 | 0.52 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.52 |
| ▸ | TYR | P14679 | 3/20 | 0.43 |
| ▸ | ALOX5 | P09917 | 5/20 | 0.41 |
| ▸ | HPGD | P15428 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | TSHR | P16473 | 2/20 | 0.41 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.41 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 3/20 | 0.40 |
| ▸ | EGFR | P00533 | 1/20 | 0.40 |
| ▸ | KLF10 | Q13118 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL959023 | 0.98 | ALOX15 (0.53) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL11800080 | 0.91 | PTGS2 (0.50) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL3656784 | 0.88 | ALOX15 (0.55) | ALOX15HTTMAPK1HPGDCYP3A4 | |
| SCHEMBL199679 | 0.86 | CYP2C19 (0.53) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL224363 | 0.86 | ALOX15 (0.57) | ALOX15HTTMAPK1HPGDCYP3A4 | |
| SCHEMBL1022752 | 0.85 | ESR1 (0.43) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL1022254 | 0.84 | ESR1 (0.42) | ALOX15HTTMAPK1TYRCYP3A4 | |
| SCHEMBL18697943 | 0.83 | TYR (0.42) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL12285794 | 0.82 | ALOX15 (0.43) | ALOX15HTTMAPK1TYRALOX5 | |
| SCHEMBL8371766 | 0.81 | CYP2C19 (0.49) | ALOX15HTTMAPK1TYRALOX5 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 47 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20090081589-A1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2009-03-26 | — | — | US | claimed |
| EP-4317287-A1 | NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, CURED PRODUCT, LAMINATE, METHOD FOR PRODUCING CURED PRODUCT, AND SEMICONDUCTOR DEVICE | FUJIFILM Corporation (JP) | 2024-02-07 | — | — | EP | disclosed |
| EP-1877865-B1 | NANOCOMPOSITE PHOTORESIST COMPOSITION FOR IMAGING THICK FILMS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| EP-2203783-B1 | THICK FILM RESISTS | MERCK PATENT GMBH (DE) | 2019-11-13 | — | — | EP | disclosed |
| US-8715918-B2 | Thick film resists | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2014-05-06 | — | — | US | disclosed |
| WO-2013064892-A2 | NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONICS MATERIALS USA CORP. (US) | 2013-05-10 | — | — | WO | disclosed |
| US-20130108956-A1 | NANOCOMPOSITE POSITIVE PHOTOSENSITIVE COMPOSITION AND USE THEREOF | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2013-05-02 | — | — | US | disclosed |
| EP-2203783-A2 | THICK FILM RESISTS | AZ Electronic Materials USA Corp. (US) | 2010-07-07 | — | — | EP | disclosed |
| US-7524606-B2 | Nanocomposite photoresist composition for imaging thick films | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-28 | — | — | US | disclosed |
| WO-2009040661-A2 | THICK FILM RESISTS | AZ ELECTRONIC MATERIALS USA CORP. (DE) | 2009-04-02 | — | — | WO | disclosed |
| EP-0753795-A1 | Positive working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-01-15 | — | — | EP | disclosed |
| EP-0745575-A1 | Method of synthesizing polyphenol compound and positive working photoresist composition comprising polyphenol compound | FUJI PHOTO FILM CO., LTD. (JP) | 1996-12-04 | — | — | EP | disclosed |
| US-5534382-A | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-09 | — | — | US | disclosed |
| US-5529881-A | ALKALI-SOLUBLE RESIN AND 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID ESTER OF SPECIFIED POLYHYDROXY COMPOUND AS PHOTOSENSITIVE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-25 | — | — | US | disclosed |
| US-5523396-A | ESTERIFICATION OF POLYHYDROXY COMPOUND WITH 1,2-NAPHTHOQUINONEDIAZIDE-5-SULFONYL CHLORIDE IN THE PRESENCE OF A BASIC CATALYST | FUJI PHOTO FILM CO., LTD. (JP) | 1996-06-04 | — | — | US | disclosed |
| EP-0710886-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-08 | — | — | EP | disclosed |
| EP-0706089-A2 | Process for synthesizing quinonediazide ester and positive working photoresist containing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-10 | — | — | EP | disclosed |
| EP-0684521-A1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0677789-A1 | Positive photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1995-10-18 | — | — | EP | disclosed |
| EP-0672952-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-09-20 | — | — | EP | disclosed |