Predicted protein targets (top 9)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.38 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.37 |
| ▸ | TSHR | P16473 | 3/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.36 |
| ▸ | EPHX2 | P34913 | 1/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.35 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27833332 | 0.86 | ALDH1A1 (0.35) | ALDH1A1TSHRL3MBTL1 | |
| SCHEMBL28425065 | 0.81 | TSHR (0.33) | ALDH1A1TSHR | |
| SCHEMBL112621 | 0.80 | ALDH1A1 (0.44) | SMN1; SMN2ALDH1A1NPSR1TSHRHSD17B10 | |
| SCHEMBL3680714 | 0.79 | ALDH1A1 (0.32) | ALDH1A1TSHR | |
| SCHEMBL1397055 | 0.79 | SMN1; SMN2 (0.38) | SMN1; SMN2ALDH1A1NPSR1TSHRHSD17B10 | |
| SCHEMBL3454512 | 0.79 | ALDH1A1 (0.39) | SMN1; SMN2ALDH1A1NPSR1TSHRHSD17B10 | |
| SCHEMBL7131819 | 0.78 | TSHR (0.33) | ALDH1A1TSHR | |
| SCHEMBL3454445 | 0.77 | MEN1 (0.42) | SMN1; SMN2ALDH1A1NPSR1EPHX2KMT2A | |
| SCHEMBL74910 | 0.76 | HSD17B10 (0.33) | SMN1; SMN2ALDH1A1HSD17B10KMT2AMEN1 | |
| SCHEMBL950609 | 0.75 | TSHR (0.34) | SMN1; SMN2ALDH1A1NPSR1TSHREPHX2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 78 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3537217-B1 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM CORP (JP) | 2022-08-31 | — | — | EP | disclosed |
| EP-2539316-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2019-10-23 | — | — | EP | disclosed |
| EP-3537217-A2 | POSITIVE RESIST COMPOSITION, RESIN USED FOR THE POSITIVE RESIST COMPOSITION, COMPOUND USED FOR SYNTHESIS OF THE RESIN AND PATTERN FORMING METHOD USING THE POSITIVE RESIST COMPOSITION | FUJIFILM Corporation (JP) | 2019-09-11 | — | — | EP | disclosed |
| EP-1795960-B1 | Positive resist composition, pattern forming method using the positive resist composition, use of the positive resit composition | FUJIFILM CORP (JP) | 2019-06-05 | — | — | EP | disclosed |
| EP-2329320-B1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN FORMING METHOD | FUJIFILM CORP (JP) | 2019-05-01 | — | — | EP | disclosed |
| CN-105283521-B | The manufacture method of utensil and device, the utensil and device that the surface conditioning agent on the surface being made of inorganic material, surface are modified | JSR株式会社 | 2018-05-11 | — | — | CN | disclosed |
| US-9835945-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2017-12-05 | — | — | US | disclosed |
| EP-2356516-B1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORP (JP) | 2017-10-25 | — | — | EP | disclosed |
| US-9709891-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-20170123318-A1 | POSITIVE RESIST COMPOSITION AND METHOD OF PATTERN FORMATION WITH THE SAME | FUJIFILM CORPORATION (JP) | 2017-05-04 | — | — | US | disclosed |
| US-20070224539-A1 | Resist composition and pattern forming method using the same | FUJIFILM CORPORATION (JP) | 2007-09-27 | — | — | US | disclosed |
| EP-1837704-A2 | Resist composition and pattern forming method using the same | FUJIFILM Corporation (JP) | 2007-09-26 | — | — | EP | disclosed |
| US-20070178405-A1 | Positive resist composition and method of pattern formation with the same | FUJI PHOTO FILM CO., LTD. | 2007-08-02 | — | — | US | disclosed |
| US-20070134588-A1 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2007-06-14 | — | — | US | disclosed |
| EP-1795960-A2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | Fujifilm Corporation (JP) | 2007-06-13 | — | — | EP | disclosed |
| US-20070077519-A1 | Pattern forming method and resist composition used therefor | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| EP-1770440-A2 | Pattern forming method and resist composition used therefor | FUJIFILM Corporation (JP) | 2007-04-04 | — | — | EP | disclosed |
| EP-1754999-A2 | Positive resist composition and method of pattern formation with the same | Fuji Photo Film Co., Ltd. (JP) | 2007-02-21 | — | — | EP | disclosed |
| US-6624257-B2 | Calculating protection ratio of a hydroxyl group of a polymer using a multiple regression calibration curve obtained by regression- analyzing main components of near infrared absorption spectra of a plurality of samples | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2003-09-23 | — | — | US | disclosed |
| US-20020052449-A1 | Method of quantifying protective ratio of hydroxyl groups of polymer compound | SUMITOMO CHEMICAL COMPANY, LIMITED | 2002-05-02 | — | — | US | disclosed |