SCHEMBL74910

SCHEMBL74910

C=C(C)C(=O)OC(CC12CC3CC(CC(C3)C1)C2)C(O)(C(F)(F)F)C(F)(F)F

nearest known ligand 0.33

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
HSD17B10 Q99714 1/20 0.33
ALDH1A1 P00352 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.31
MEN1 O00255 2/20 0.30
KMT2A Q03164 2/20 0.30
L3MBTL1 Q9Y468 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9926622 0.93
SCHEMBL9610653 0.91 ALDH1A1 (0.31) HSD17B10ALDH1A1SMN1; SMN2
SCHEMBL23963407 0.84 HSD17B10 (0.33) HSD17B10ALDH1A1SMN1; SMN2MEN1KMT2A
SCHEMBL15116338 0.81 MEN1 (0.37) HSD17B10ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL15178410 0.81
SCHEMBL20215413 0.79 ALDH1A1 (0.35) HSD17B10ALDH1A1MEN1KMT2AL3MBTL1
SCHEMBL74914 0.78 HSD11B1 (0.31)
SCHEMBL19400635 0.77
SCHEMBL74905 0.77 ALDH1A1 (0.33) ALDH1A1MEN1KMT2A
SCHEMBL15178378 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 242 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11786160-B2 Bio-electrode composition, bio-electrode, and method for manufacturing bio-electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-10-17 US disclosed
US-20230159766-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-25 US disclosed
US-11357970-B2 Biomedical electrode composition, biomedical electrode and method for manufacturing the biomedical electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2022-06-14 US disclosed
US-11208509-B2 Polymer compound for conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-28 US disclosed
US-20210380738-A1 CONDUCTIVE POLYMER COMPOSITION, SUBSTRATE, AND METHOD FOR PRODUCING SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2021-12-09 US disclosed
US-10851188-B2 Polymer compound for conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-12-01 US disclosed
US-20200291145-A1 POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-09-17 US disclosed
US-20200259094-A1 CONDUCTIVE POLYMER COMPOSITE AND CONDUCTIVE POLYMER COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-13 US disclosed
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-08-06 US disclosed
US-10726967-B2 Polymerizable monomer, polymer compound, biological electrode composition, biological electrode, and method for producing biological electrode SHIN-ETSU CHEMICAL CO., LTD. (JP) 2020-07-28 US disclosed
US-20090087786-A1 PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-02 US disclosed
US-20090087786-A1 PATTERNING PROCESS AND RESIST COMPOSITION USED THEREIN SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-04-02 US disclosed
US-20090081595-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-26 US disclosed
US-20090081595-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-03-26 US disclosed
US-20090053651-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-20090053651-A1 PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-02-26 US disclosed
US-20080199806-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-08-21 US disclosed
US-20080199806-A1 PATTERNING PROCESS AND RESIST COMPOSITION SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-08-21 US disclosed
US-20070178407-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-08-02 US disclosed
US-20070178407-A1 Polymer, resist protective coating material, and patterning process SHIN-ETSU CHEMICAL CO., LTD. 2007-08-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20200247926-A1 POLYMERIZABLE MONOMER, POLYMER COMPOUND FOR CONDUCTIVE POLYMER, AND METHOD FOR PRODUCING THE POLYMER COMPOUND HCN4, HCN2, HCN3 HSD17B10 1618/4885ALDH1A1 2526/4885SMN1; SMN2 2771/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.