Predicted protein targets (top 16)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ELANE | P08246 | 4/20 | 0.54 |
| ▸ | TSHR | P16473 | 5/20 | 0.46 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.46 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.46 |
| ▸ | THRB | P10828 | 2/20 | 0.43 |
| ▸ | THRA | P10827 | 1/20 | 0.43 |
| ▸ | HPGD | P15428 | 1/20 | 0.42 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.42 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.42 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.41 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7534893 | 0.91 | ELANE (0.44) | ELANETHRBTHRAHPGDKMT2A | |
| SCHEMBL7945225 | 0.88 | ELANE (0.54) | ELANETSHRTDP1L3MBTL1THRB | |
| SCHEMBL7541864 | 0.85 | LMNA (0.47) | TSHRTHRBTHRAHPGDKMT2A | |
| SCHEMBL29315128 | 0.82 | ELANE (0.62) | ELANETSHRTDP1L3MBTL1KMT2A | |
| SCHEMBL2544756 | 0.81 | ELANE (0.58) | ELANETSHRTDP1L3MBTL1KMT2A | |
| SCHEMBL2196872 | 0.81 | USP2 (0.53) | TSHRTDP1L3MBTL1HPGDKMT2A | |
| SCHEMBL8625233 | 0.80 | ELANE (0.61) | ELANETSHRTDP1L3MBTL1KMT2A | |
| SCHEMBL406835 | 0.80 | CYP1A2 (0.56) | TSHRTDP1L3MBTL1HPGDKMT2A | |
| SCHEMBL2791736 | 0.79 | PTGDR2 (0.42) | TSHRHPGDKMT2AMAPK1ALDH1A1 | |
| SCHEMBL727949 | 0.79 | ELANE (0.59) | ELANETSHRTDP1L3MBTL1CYP3A4 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6255032-B1 | Chemically amplified color resist composition | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2001-07-03 | — | — | US | claimed |
| EP-0797792-B1 | PHOTOLITHOGRAPHIC METHOD OF PRODUCING STRUCTURAL FEATURES | SIEMENS AG (DE) | 1998-11-18 | — | — | EP | claimed |
| EP-0361906-A2 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | HOECHST CELANESE CORPORATION (US) | 1990-04-04 | — | — | EP | claimed |
| JP-4359906-A | — | — | None | — | — | JP | disclosed |
| JP-4253939-A | — | — | None | — | — | JP | disclosed |
| WO-2024047976-A1 | PHOTOCURABLE INK-JET INK COMPOSITION | サカタインクス株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024029176-A1 | PHOTOCURABLE INKJET INK COMPOSITION | ＫＪケミカルズ株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2023188625-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023188627-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023188628-A1 | ACTIVE ENERGY RAY-CURABLE INK COMPOSITION FOR REVERSE PRINTING | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023037712-A1 | DIGITAL EMBOSSING CREATION METHOD | サカタインクス株式会社 | 2023-03-16 | — | — | WO | disclosed |
| US-4996136-A | Radiation sensitive materials and devices made therewith | AT&T BELL LABORATORIES (US) | 1991-02-26 | — | — | US | disclosed |
| EP-0291670-B1 | VAPOR PHASE PHOTORESIST SILYLATION PROCESS | International Business Machines Corporation (US) | 1991-02-20 | — | — | EP | disclosed |
| EP-0405957-A1 | Deep U.V. photoresist compositions containing polycyclic cyclopentane -2- diazo-1,3-dione | HOECHST CELANESE CORPORATION (US) | 1991-01-02 | — | — | EP | disclosed |
| EP-0404206-A2 | Resist compositions | International Business Machines Corporation (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0366590-A2 | Highly sensitive positive photoresist compositions | International Business Machines Corporation (US) | 1990-05-02 | — | — | EP | disclosed |
| EP-0330386-A2 | Radiation sensitive materials and devices made therewith | AT&T Corp. (US) | 1989-08-30 | — | — | EP | disclosed |
| EP-0291670-A1 | Vapor phase photoresist silylation process | International Business Machines Corporation (US) | 1988-11-23 | — | — | EP | disclosed |
| EP-0264908-A2 | High sensitivity resists having autodecomposition temperatures greater than about 160 C | International Business Machines Corporation (US) | 1988-04-27 | — | — | EP | disclosed |
| EP-0254853-A2 | Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network | International Business Machines Corporation (US) | 1988-02-03 | — | — | EP | disclosed |