Predicted protein targets (top 17)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.53 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.49 |
| ▸ | TSHR | P16473 | 4/20 | 0.49 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.44 |
| ▸ | BCHE | P06276 | 4/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | EGFR | P00533 | 1/20 | 0.43 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.43 |
| ▸ | ACHE | P22303 | 2/20 | 0.43 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 1/20 | 0.43 |
| ▸ | MEN1 | O00255 | 1/20 | 0.43 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.43 |
| ▸ | PPARA | Q07869 | 1/20 | 0.42 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7534897 | 0.91 | LMNA (0.49) | TDP1KDM4EL3MBTL1ALDH1A1LMNA | |
| 4-Vinylphenol SCHEMBL2475241 | 0.88 | TDP1 (0.44) | TDP1KDM4ETSHRL3MBTL1ALDH1A1 | |
| SCHEMBL2544758 | 0.84 | TSHR (0.51) | TDP1KDM4ETSHRL3MBTL1ALDH1A1 | |
| SCHEMBL10356077 | 0.84 | ATM (0.56) | TDP1KDM4ETSHRL3MBTL1ALDH1A1 | |
| SCHEMBL7541866 | 0.84 | MEN1 (0.53) | TDP1KDM4EL3MBTL1ALDH1A1LMNA | |
| SCHEMBL9127873 | 0.81 | AKR1B10 (0.42) | TDP1ALDH1A1BCHEHDAC3ACHE | |
| SCHEMBL10767564 | 0.81 | TSHR (0.45) | TDP1TSHRL3MBTL1ALDH1A1CYP3A4 | |
| SCHEMBL9595722 | 0.81 | TDP1 (0.55) | TDP1KDM4ETSHRL3MBTL1ALDH1A1 | |
| SCHEMBL2196874 | 0.79 | TDP1 (0.51) | TDP1KDM4ETSHRL3MBTL1ALDH1A1 | |
| SCHEMBL8508728 | 0.79 | HCAR2 (0.56) | TDP1TSHRALDH1A1CYP3A4MAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 150 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6255032-B1 | Chemically amplified color resist composition | INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) | 2001-07-03 | — | — | US | claimed |
| EP-0520265-B1 | Positive working radiation-sensitive composition with disulfone acid generators | BASF AG (DE) | 1999-11-17 | — | — | EP | claimed |
| EP-0797792-B1 | PHOTOLITHOGRAPHIC METHOD OF PRODUCING STRUCTURAL FEATURES | SIEMENS AG (DE) | 1998-11-18 | — | — | EP | claimed |
| EP-0540965-A1 | Positive light sensitive composition and process for the formation of relief pattern | BASF Aktiengesellschaft (DE) | 1993-05-12 | — | — | EP | claimed |
| EP-0361906-A2 | Method of producing an image reversal negative photoresist having a photo-labile blocked imide | HOECHST CELANESE CORPORATION (US) | 1990-04-04 | — | — | EP | claimed |
| JP-4253939-A | — | — | None | — | — | JP | disclosed |
| JP-4359906-A | — | — | None | — | — | JP | disclosed |
| WO-2024047976-A1 | PHOTOCURABLE INK-JET INK COMPOSITION | サカタインクス株式会社 | 2024-03-07 | — | — | WO | disclosed |
| WO-2024029176-A1 | PHOTOCURABLE INKJET INK COMPOSITION | ＫＪケミカルズ株式会社 | 2024-02-08 | — | — | WO | disclosed |
| WO-2023188625-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023188627-A1 | ACTIVE ENERGY RAY-CURABLE ADHESIVE COMPOSITION | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| WO-2023188628-A1 | ACTIVE ENERGY RAY-CURABLE INK COMPOSITION FOR REVERSE PRINTING | サカタインクス株式会社 | 2023-10-05 | — | — | WO | disclosed |
| US-4996136-A | Radiation sensitive materials and devices made therewith | AT&T BELL LABORATORIES (US) | 1991-02-26 | — | — | US | disclosed |
| EP-0291670-B1 | VAPOR PHASE PHOTORESIST SILYLATION PROCESS | International Business Machines Corporation (US) | 1991-02-20 | — | — | EP | disclosed |
| EP-0405957-A1 | Deep U.V. photoresist compositions containing polycyclic cyclopentane -2- diazo-1,3-dione | HOECHST CELANESE CORPORATION (US) | 1991-01-02 | — | — | EP | disclosed |
| EP-0404206-A2 | Resist compositions | International Business Machines Corporation (US) | 1990-12-27 | — | — | EP | disclosed |
| EP-0366590-A2 | Highly sensitive positive photoresist compositions | International Business Machines Corporation (US) | 1990-05-02 | — | — | EP | disclosed |
| EP-0330386-A2 | Radiation sensitive materials and devices made therewith | AT&T Corp. (US) | 1989-08-30 | — | — | EP | disclosed |
| EP-0291670-A1 | Vapor phase photoresist silylation process | International Business Machines Corporation (US) | 1988-11-23 | — | — | EP | disclosed |
| EP-0254853-A2 | Lithographic method employing thermally stable photoresists with high sensitivity forming a hydogen-bonded network | International Business Machines Corporation (US) | 1988-02-03 | — | — | EP | disclosed |