Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CLK2 | P49760 | 2/20 | 0.49 |
| ▸ | DYRK1A | Q13627 | 2/20 | 0.49 |
| ▸ | CLK4 | Q9HAZ1 | 2/20 | 0.49 |
| ▸ | DYRK3 | O43781 | 1/20 | 0.49 |
| ▸ | CLK1 | P49759 | 1/20 | 0.49 |
| ▸ | CLK3 | P49761 | 1/20 | 0.49 |
| ▸ | GSK3B | P49841 | 1/20 | 0.49 |
| ▸ | CDK5 | Q00535 | 1/20 | 0.49 |
| ▸ | CDK5R1 | Q15078 | 1/20 | 0.49 |
| ▸ | DYRK2 | Q92630 | 1/20 | 0.49 |
| ▸ | DYRK1B | Q9Y463 | 1/20 | 0.49 |
| ▸ | JAK2 | O60674 | 2/20 | 0.47 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.44 |
| ▸ | MKNK1 | Q9BUB5 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.43 |
| ▸ | GP6 | Q9HCN6 | 1/20 | 0.41 |
| ▸ | GAA | P10253 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL27708745 | 0.98 | DYRK3 (0.47) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL27708680 | 0.98 | DYRK3 (0.47) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| Bicarbonate SCHEMBL8741996 | 0.93 | GSK3B (0.44) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL23348984 | 0.92 | CLK1 (0.37) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL19640293 | 0.90 | CLK1 (0.34) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL29717708 | 0.85 | FGFR1 (0.49) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL20873828 | 0.85 | FGFR1 (0.49) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL10948559 | 0.85 | FGFR1 (0.49) | CLK2DYRK1ACLK4DYRK3CLK1 | |
| SCHEMBL18608304 | 0.83 | SMN1; SMN2 (0.37) | GSK3BCDK5CDK5R1NPC1GAA | |
| SCHEMBL31072427 | 0.82 | ALDH1A1 (0.41) | CLK4DYRK1BNPC1MEN1KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 906 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4643371-A1 | COMPOSITION FOR SELECTIVELY REMOVING OXIDE COMPOUNDS AND ETCHING RESIDUES OF ONE OR BOTH OF CO AND CU | BASF SE (DE) | 2025-11-05 | — | — | EP | claimed |
| EP-3774680-B1 | CLEANING COMPOSITIONS | FUJIFILM ELECTRONIC MAT USA INC (US) | 2025-09-24 | — | — | EP | claimed |
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | BASF SE (DE) | 2025-06-17 | — | — | US | claimed |
| WO-2025108836-A1 | COMPOSITIONS FOR REMOVING PHOTORESIST AND ETCH RESIDUES, METHODS OF USING AND USE THEREOF | MERCK PATENT GMBH (DE) | 2025-05-30 | — | — | WO | claimed |
| US-12187984-B2 | Treatment liquid and method for treating object to be treated | FUJIFILM CORPORATION (JP) | 2025-01-07 | — | — | US | claimed |
| CN-119220353-A | Application of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220352-A | Preparation method of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220351-A | Application of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220354-A | Cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| CN-119220356-A | Preparation method of cleaning liquid | 上海新阳半导体材料股份有限公司 | 2024-12-31 | — | — | CN | claimed |
| WO-2005085957-A1 | COMPOSITION AND PROCESS FOR POST-ETCH REMOVAL OF PHOTORESIST AND/OR SACRIFICIAL ANTI-REFLECTIVE MATERIAL DEPOSITED ON A SUBSTRATE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2005-09-15 | — | — | WO | claimed |
| US-20050197265-A1 | Composition including an active cleaning combination selected from a quaternary ammonium base in combination with at least one of alkali and alkaline earth base and a strong base in combination with an oxidant; semiconductors | TRUIST BANK, AS NOTES COLLATERAL AGENT | 2005-09-08 | — | — | US | claimed |
| US-20040206941-A1 | Composition for enhancing conductivity of a carrier medium and method of use thereof | GURIN MICHAEL H (US) | 2004-10-21 | — | — | US | claimed |
| US-20040069454-A1 | Composition for enhancing thermal conductivity of a heat transfer medium and method of use thereof | COGNITEK SYSTEMS MANAGEMENT, INC. | 2004-04-15 | — | — | US | claimed |
| EP-1190112-B1 | METHOD OF INHIBITING CORROSION OF COPPER SURFACES | BETZDEARBORN INC (US) | 2003-10-15 | — | — | EP | claimed |
| WO-2003060035-A1 | COMPOSITION FOR ENHANCING THERMAL CONDUCTIVITY OF A HEAT TRANSFER MEDIUM AND METHOD OF USE THEREOF | COGNITEK MANAGEMENT SYSTEMS, INC. (US) | 2003-07-24 | — | — | WO | claimed |
| CN-1347465-A | Halogen resistant corrosion inhibitors | BETZDEARBORN INC (US) | 2002-05-01 | — | — | CN | claimed |
| EP-1190112-A1 | HALOGEN RESISTANT CORROSION INHIBITORS | BetzDearborn Inc (US) | 2002-03-27 | — | — | EP | claimed |
| WO-2000061836-A1 | HALOGEN RESISTANT CORROSION INHIBITORS | BETZDEARBORN INC. (US) | 2000-10-19 | — | — | WO | claimed |
| US-6103144-A | OXIDATION HALOGEN BIOCIDES WITH CORROSION INHIBITORS OF BENZOTRIAZOLES | BETZDEARBORN INC. (US) | 2000-08-15 | — | — | US | claimed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12331239-B2 | Composition and process for selectively etching a layer comprising an aluminium compound in the presence of layers of low-k materials, copper and/or cobalt | STK11, CRKL, STK10 | CLK2 8/4885DYRK1A 756/4885CLK4 27/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.