⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5355267 | 0.85 | — | — | |
| SCHEMBL3846262 | 0.81 | — | — | |
| SCHEMBL143769 | 0.81 | FDPS (1.00) | — | |
| SCHEMBL18670139 | 0.81 | — | — | |
| Tert-Butylamine SCHEMBL1310967 | 0.80 | FDPS (0.62) | — | |
| Tert-Butylamine SCHEMBL1310969 | 0.80 | FDPS (0.62) | — | |
| Ethane SCHEMBL11407880 | 0.79 | FDPS (0.93) | — | |
| SCHEMBL10723669 | 0.79 | — | — | |
| SCHEMBL10946360 | 0.79 | FDPS (0.93) | — | |
| SCHEMBL27649061 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 80 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113321776-B | Mud-resistant polycarboxylate water reducer | 山西宝路加交通科技有限公司 | 2023-08-25 | — | — | CN | claimed |
| CN-114599773-A | Fabric care compositions with improved microbial robustness and methods of use thereof | 高露洁-棕榄公司 | 2022-06-07 | — | — | CN | claimed |
| CN-113321776-A | Mud-resistant polycarboxylic acid water reducing agent | 杭州树派环保科技有限公司 | 2021-08-31 | — | — | CN | claimed |
| US-9678430-B2 | Composition and process for stripping photoresist from a surface including titanium nitride | ENTEGRIS, INC. (US) | 2017-06-13 | — | — | US | claimed |
| US-20150307818-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECH MATERIALS (US) | 2015-10-29 | — | — | US | claimed |
| US-20150168843-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ENTEGRIS, INC. (US) | 2015-06-18 | — | — | US | claimed |
| EP-2850495-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | Entegris, Inc. (US) | 2015-03-25 | — | — | EP | claimed |
| WO-2013173738-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-21 | — | — | WO | claimed |
| US-20120282351-A1 | System and Method for The Prevention of Bacterial and Fungal Infections Including Urinary Tract Infections (UTI) Using N-Halogenated Amino Acids | NOVABAY PHARMACEUTICALS, INC. | 2012-11-08 | — | — | US | claimed |
| US-7690783-B2 | Ink for inkjet printing, lithographic printing plate using it and method for making such plate | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | claimed |
| WO-2010017405-A1 | METHODS AND COMPOSITIONS FOR THE TREATMENT OF PAIN | HELLER ADAM (US) | 2010-02-11 | — | — | WO | claimed |
| US-20100010456-A1 | System and Method for the Prevention of Bacterial and Fungal Infections Including Urinary Tract Infection (UTI) Using N-Halogenated Amino Acids | NOVACAL PHARMACEUTICALS, INC. | 2010-01-14 | — | — | US | claimed |
| JP-2009511493-A | — | — | 2009-03-19 | — | — | JP | claimed |
| EP-1948154-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-07-30 | — | — | EP | claimed |
| EP-1896001-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-03-12 | — | — | EP | claimed |
| US-20070244449-A1 | System and method for the prevention of bacterial and fungal infections including Urinary Tract Infections (UTI) using N-halogenated amino acids | NOVACAL PHARMACEUTICALS, INC. | 2007-10-18 | — | — | US | claimed |
| WO-2007044559-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2007-04-19 | — | — | WO | claimed |
| US-20060247209-A1 | N-halogenated amino acids, N,N-dihalogenated amino acids and derivatives; compositions and methods of using them | NOVABAY PHARMACEUTICALS, INC. | 2006-11-02 | — | — | US | claimed |
| WO-2006081392-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2006-08-03 | — | — | WO | claimed |
| US-20250002818-A1 | CLEANING SOLUTION, METHOD FOR CLEANING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| US-11772085-B2 | Far superior oxidation catalysts based on macrocyclic compounds | CARNEGIE MELLON UNIVERSITY (US) | 2023-10-03 | — | — | US | disclosed |
| CN-113321776-B | Mud-resistant polycarboxylate water reducer | 山西宝路加交通科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| EP-4015511-A1 | OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | CARNEGIE MELLON UNIVERSITY (US) | 2022-06-22 | — | — | EP | disclosed |
| EP-4015511-A1 | OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | CARNEGIE MELLON UNIVERSITY (US) | 2022-06-22 | — | — | EP | disclosed |
| CN-114599773-A | Fabric care compositions with improved microbial robustness and methods of use thereof | 高露洁-棕榄公司 | 2022-06-07 | — | — | CN | disclosed |
| EP-3353157-B1 | OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | UNIV CARNEGIE MELLON (US) | 2021-11-24 | — | — | EP | disclosed |
| CN-113321776-A | Mud-resistant polycarboxylic acid water reducing agent | 杭州树派环保科技有限公司 | 2021-08-31 | — | — | CN | disclosed |
| US-10926248-B2 | Far superior oxidation catalysts based on macrocyclic compounds | CARNEGIE MELLON UNIVERSITY (US) | 2021-02-23 | — | — | US | disclosed |
| CN-105073757-B | Dyeing process using a hair-dyeing precursor obtained from an iridoid, composition, precursor and device comprising such a precursor | 莱雅公司 | 2019-12-17 | — | — | CN | disclosed |
| EP-3353157-A1 | FAR SUPERIOR OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | Carnegie Mellon University (US) | 2018-08-01 | — | — | EP | disclosed |
| US-9678430-B2 | Composition and process for stripping photoresist from a surface including titanium nitride | ENTEGRIS, INC. (US) | 2017-06-13 | — | — | US | disclosed |
| WO-2017053564-A1 | FAR SUPERIOR OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | CARNEGIE MELLON UNIVERSITY (US) | 2017-03-30 | — | — | WO | disclosed |
| WO-2017053564-A1 | FAR SUPERIOR OXIDATION CATALYSTS BASED ON MACROCYCLIC COMPOUNDS | CARNEGIE MELLON UNIVERSITY (US) | 2017-03-30 | — | — | WO | disclosed |
| CN-105101947-A | Dyeing method using iridoid compound and apparatus therefor | OREAL | 2015-11-25 | — | — | CN | disclosed |
| CN-105073723-A | Compounds derived from protected or unprotected iridoids, compositions comprising same, use as dyes for keratin fibres and devices | OREAL | 2015-11-18 | — | — | CN | disclosed |
| CN-105073757-A | Dyeing method using a hair-dyeing precursor obtained from iridoids, composition, precursor and device including same | OREAL | 2015-11-18 | — | — | CN | disclosed |
| US-20150307818-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECH MATERIALS (US) | 2015-10-29 | — | — | US | disclosed |
| US-9063431-B2 | Aqueous cleaner for the removal of post-etch residues | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2015-06-23 | — | — | US | disclosed |
| US-20150168843-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ENTEGRIS, INC. (US) | 2015-06-18 | — | — | US | disclosed |
| EP-2850495-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | Entegris, Inc. (US) | 2015-03-25 | — | — | EP | disclosed |
| EP-2725008-A1 | N,N-dihalogenated amino acids and derivatives | NovaBay Pharmaceuticals, Inc. (US) | 2014-04-30 | — | — | EP | disclosed |
| WO-2013173738-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-21 | — | — | WO | disclosed |
| US-20130296214-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-07 | — | — | US | disclosed |
| EP-2593964-A2 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | Advanced Technology Materials, Inc. (US) | 2013-05-22 | — | — | EP | disclosed |
| US-20120282351-A1 | System and Method for The Prevention of Bacterial and Fungal Infections Including Urinary Tract Infections (UTI) Using N-Halogenated Amino Acids | NOVABAY PHARMACEUTICALS, INC. | 2012-11-08 | — | — | US | disclosed |
| WO-2012009639-A9 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-05-24 | — | — | WO | disclosed |
| WO-2012009639-A2 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2012-01-19 | — | — | WO | disclosed |
| CN-1902158-B | N,N-dihalogenated amino acids and derivatives | NOVACAL PHARMACEUTICALS INC | 2011-04-06 | — | — | CN | disclosed |
| US-7893109-B2 | N,N-dihalogenated amino acids and derivatives | NOVABAY PHARMACEUTICALS, INC. (US) | 2011-02-22 | — | — | US | disclosed |
| US-7846971-B2 | N-halogenated amino acids, N,N-dihalogenated amino acids and derivatives; compositions and methods of using them | NOVABAY PHARMACEUTICALS, INC. (US) | 2010-12-07 | — | — | US | disclosed |
| US-20100261632-A1 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-10-14 | — | — | US | disclosed |
| WO-2010091045-A2 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF POLYMERS AND OTHER ORGANIC MATERIAL FROM A SURFACE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2010-08-12 | — | — | WO | disclosed |
| CN-1873058-B | Plating solution, conductive material, and surface treatment method of conductive material | TDK CORP | 2010-06-23 | — | — | CN | disclosed |
| US-7690783-B2 | Ink for inkjet printing, lithographic printing plate using it and method for making such plate | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | disclosed |
| WO-2010017405-A1 | METHODS AND COMPOSITIONS FOR THE TREATMENT OF PAIN | HELLER ADAM (US) | 2010-02-11 | — | — | WO | disclosed |
| US-20100010456-A1 | System and Method for the Prevention of Bacterial and Fungal Infections Including Urinary Tract Infection (UTI) Using N-Halogenated Amino Acids | NOVACAL PHARMACEUTICALS, INC. | 2010-01-14 | — | — | US | disclosed |
| WO-2009032460-A1 | NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2009-03-12 | — | — | WO | disclosed |
| US-20090023812-A1 | N,N-DIHALOGENATED AMINO ACIDS AND DERIVATIVES | NOVABAY PHARMACEUTICALS, INC. | 2009-01-22 | — | — | US | disclosed |
| US-7462361-B2 | N,N-dihalogenated amino acids and derivatives | NOVABAY PHARMACEUTICALS, INC. (US) | 2008-12-09 | — | — | US | disclosed |
| EP-1948154-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-07-30 | — | — | EP | disclosed |
| EP-1927889-A1 | Lithographic printing plate precursor | FUJIFILM Corporation (JP) | 2008-06-04 | — | — | EP | disclosed |
| EP-1896001-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-03-12 | — | — | EP | disclosed |
| CN-101132785-A | N-halogenated amino acids and N, N-dihalogenated amino acids in combination with hypohalous acids | NOVABAY PHARMACEUTICALS INC (US) | 2008-02-27 | — | — | CN | disclosed |
| EP-1656095-A4 | N,N-DIHALOGENATED AMINO ACIDS AND DERIVATIVES | NOVACAL PHARMACEUTICALS INC (US) | 2007-11-28 | — | — | EP | disclosed |
| US-20070244449-A1 | System and method for the prevention of bacterial and fungal infections including Urinary Tract Infections (UTI) using N-halogenated amino acids | NOVACAL PHARMACEUTICALS, INC. | 2007-10-18 | — | — | US | disclosed |
| WO-2007044559-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2007-04-19 | — | — | WO | disclosed |
| CN-1902158-A | N,N-dihalogenated amino acids and derivatives | NOVACAL PHARMACEUTICALS INC (US) | 2007-01-24 | — | — | CN | disclosed |
| CN-1873058-A | Plating solution, conductive material, and surface treatment method of conductive material | TDK CORP (JP) | 2006-12-06 | — | — | CN | disclosed |
| US-20060247209-A1 | N-halogenated amino acids, N,N-dihalogenated amino acids and derivatives; compositions and methods of using them | NOVABAY PHARMACEUTICALS, INC. | 2006-11-02 | — | — | US | disclosed |
| US-20060231409-A1 | Plating solution, conductive material, and surface treatment method of conductive material | TDK CORPORATION (JP) | 2006-10-19 | — | — | US | disclosed |
| EP-1693427-A2 | Ink for inkjet printing, lithographic printing plate using it and method for making such plate | FUJI PHOTO FILM CO., LTD. (JP) | 2006-08-23 | — | — | EP | disclosed |
| US-20060181591-A1 | Ink for inkjet printing, lithographic printing plate using it and method for making such plate | FUJI PHOTO FILM CO., LTD. | 2006-08-17 | — | — | US | disclosed |
| WO-2006081392-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2006-08-03 | — | — | WO | disclosed |
| EP-1656095-A2 | N,N-DIHALOGENATED AMINO ACIDS AND DERIVATIVES | NovaCal Pharmaceuticals, Inc. (US) | 2006-05-17 | — | — | EP | disclosed |
| US-20050065115-A1 | N,N-dihalogenated amino acids and derivatives | NOVABAY PHARMACEUTICALS, INC. | 2005-03-24 | — | — | US | disclosed |
| WO-2005020896-A2 | N,N-DIHALOGENATED AMINO ACIDS AND DERIVATIVES | NOVACAL PHARMACEUTICALS, INC. (US) | 2005-03-10 | — | — | WO | disclosed |
| US-6558873-B1 | Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1091251-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |
| EP-0813537-A1 | PHOSPHORYLATED NITRONE DERIVATIVES, METHOD FOR PREPARING SAME, AND COMPOSITIONS CONTAINING SAID DERIVATIVES | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (CNRS) (FR) | 1997-12-29 | — | — | EP | disclosed |
| WO-1996027601-A1 | PHOSPHORYLATED NITRONE DERIVATIVES, METHOD FOR PREPARING SAME, AND COMPOSITIONS CONTAINING SAID DERIVATIVES | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) | 1996-09-12 | — | — | WO | disclosed |
| WO-1996027601-A1 | PHOSPHORYLATED NITRONE DERIVATIVES, METHOD FOR PREPARING SAME, AND COMPOSITIONS CONTAINING SAID DERIVATIVES | CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE (C.N.R.S.) (FR) | 1996-09-12 | — | — | WO | disclosed |