⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Isopropylamine SCHEMBL27808752 | 0.88 | — | — | |
| Isobutane SCHEMBL760795 | 0.82 | ALDH1A1 (0.33) | — | |
| Isobutane SCHEMBL5096181 | 0.82 | — | — | |
| Phosphonic Acid SCHEMBL9132866 | 0.82 | — | — | |
| SCHEMBL579981 | 0.80 | — | — | |
| Alanine SCHEMBL9329114 | 0.79 | SLC7A5 (0.48) | — | |
| Phosphonic Acid SCHEMBL27819029 | 0.79 | SLC7A5 (0.35) | — | |
| Alanine SCHEMBL27919223 | 0.79 | SLC7A5 (0.48) | — | |
| Isopropylamine SCHEMBL354242 | 0.79 | GABRP (0.31) | — | |
| Isopropyl Alcohol SCHEMBL814725 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 55 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9678430-B2 | Composition and process for stripping photoresist from a surface including titanium nitride | ENTEGRIS, INC. (US) | 2017-06-13 | — | — | US | claimed |
| US-20150307818-A1 | AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES | ADVANCED TECH MATERIALS (US) | 2015-10-29 | — | — | US | claimed |
| US-20150168843-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ENTEGRIS, INC. (US) | 2015-06-18 | — | — | US | claimed |
| EP-2850495-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | Entegris, Inc. (US) | 2015-03-25 | — | — | EP | claimed |
| WO-2013173738-A1 | COMPOSITION AND PROCESS FOR STRIPPING PHOTORESIST FROM A SURFACE INCLUDING TITANIUM NITRIDE | ADVANCED TECHNOLOGY MATERIALS, INC. (US) | 2013-11-21 | — | — | WO | claimed |
| US-20120282351-A1 | System and Method for The Prevention of Bacterial and Fungal Infections Including Urinary Tract Infections (UTI) Using N-Halogenated Amino Acids | NOVABAY PHARMACEUTICALS, INC. | 2012-11-08 | — | — | US | claimed |
| US-7690783-B2 | Ink for inkjet printing, lithographic printing plate using it and method for making such plate | FUJIFILM CORPORATION (JP) | 2010-04-06 | — | — | US | claimed |
| WO-2010017405-A1 | METHODS AND COMPOSITIONS FOR THE TREATMENT OF PAIN | HELLER ADAM (US) | 2010-02-11 | — | — | WO | claimed |
| US-20100010456-A1 | System and Method for the Prevention of Bacterial and Fungal Infections Including Urinary Tract Infection (UTI) Using N-Halogenated Amino Acids | NOVACAL PHARMACEUTICALS, INC. | 2010-01-14 | — | — | US | claimed |
| JP-2009511493-A | — | — | 2009-03-19 | — | — | JP | claimed |
| EP-1948154-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-07-30 | — | — | EP | claimed |
| EP-1896001-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | Novabay Pharmaceuticals, Inc. (US) | 2008-03-12 | — | — | EP | claimed |
| US-20070244449-A1 | System and method for the prevention of bacterial and fungal infections including Urinary Tract Infections (UTI) using N-halogenated amino acids | NOVACAL PHARMACEUTICALS, INC. | 2007-10-18 | — | — | US | claimed |
| WO-2007044559-A1 | SYSTEM AND METHOD FOR THE PREVENTION OF BACTERIAL AND FUNGAL INFECTIONS INCLUDING URINARY TRACT INFECTIONS (UTI) USING N-HALOGENATED AMINO ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2007-04-19 | — | — | WO | claimed |
| US-20060247209-A1 | N-halogenated amino acids, N,N-dihalogenated amino acids and derivatives; compositions and methods of using them | NOVABAY PHARMACEUTICALS, INC. | 2006-11-02 | — | — | US | claimed |
| WO-2006081392-A1 | N-HALOGENATED AMINO ACIDS AND N, N-DIHALOGENATED AMINO ACIDS IN COMBINATION WITH HYPOHALOUS ACIDS | NOVABAY PHARMACEUTICALS, INC. (US) | 2006-08-03 | — | — | WO | claimed |
| US-20250002818-A1 | CLEANING SOLUTION, METHOD FOR CLEANING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-01-02 | — | — | US | disclosed |
| US-9678430-B2 | Composition and process for stripping photoresist from a surface including titanium nitride | ENTEGRIS, INC. (US) | 2017-06-13 | — | — | US | disclosed |
| US-6558873-B1 | Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum | FUJI PHOTO FILM CO., LTD. (JP) | 2003-05-06 | — | — | US | disclosed |
| EP-1091251-A2 | Lithographic printing plate precursor | FUJI PHOTO FILM CO., LTD. (JP) | 2001-04-11 | — | — | EP | disclosed |