SCHEMBL3667007

SCHEMBL3667007

Cc1ccc(CN)c(CN)c1C

nearest known ligand 0.34

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
TAAR1 Q96RJ0 2/20 0.34
HTR2A P28223 1/20 0.32
HTR2C P28335 1/20 0.32
HTR2B P41595 1/20 0.32
POLB P06746 1/20 0.31
PNMT P11086 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8897260 0.83 TAAR1 (0.35) TAAR1PNMT
SCHEMBL29726557 0.83 TAAR1 (0.35) TAAR1PNMT
SCHEMBL395903 0.82 POLB (0.35) TAAR1HTR2AHTR2CHTR2BPOLB
SCHEMBL11021619 0.81 TAAR1 (0.34) TAAR1POLBPNMT
SCHEMBL394776 0.80 TAAR1 (0.37) TAAR1POLBPNMT
Hydrochloric Acid SCHEMBL28656395 0.78 TAAR1 (0.35) TAAR1HTR2AHTR2CHTR2BPOLB
Water SCHEMBL4649643 0.78 TAAR1 (0.35) TAAR1POLBPNMT
Iodide SCHEMBL10967243 0.78 TAAR1 (0.35) TAAR1POLBPNMT
SCHEMBL3673510 0.77 TAAR1 (0.32) TAAR1
SCHEMBL3667297 0.77 PNMT (0.40) TAAR1PNMT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114310656-B Polishing pad, method for manufacturing polishing pad, and method for manufacturing semiconductor device SK恩普士有限公司 2024-03-08 CN disclosed
EP-1426392-B1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL CO (JP) 2010-02-24 EP disclosed
WO-2008138595-A1 ELASTIC FIBER DSM IP ASSETS B.V. (NL) 2008-11-20 WO disclosed
US-6960640-B2 Composition for optical material MITSUBISHI GAS CHEMICAL CO., LTD. (JP) 2005-11-01 US disclosed
US-20040147708-A1 Composition for optical material MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-07-29 US disclosed
EP-1426392-A1 COMPOSITION FOR OPTICAL MATERIAL MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2004-06-09 EP disclosed
EP-1143991-A2 INHIBITORS OF H+K+ -ATPASE Advanced Medicine, Inc. (US) 2001-10-17 EP disclosed
WO-1999063940-A2 INHIBITORS OF H+K+-ATPase ADVANCED MEDICINE, INC. (US) 1999-12-16 WO disclosed
US-4253886-A Corrosion resistant ferromagnetic metal powders and method of preparing the same FUJI PHOTO FILM CO., LTD. (JP) 1981-03-03 US disclosed
US-4137217-A QUARTERNARY AMMONIUM POLYAMINE-POLYCARBOXYLIC ACID Tsuchida, Eishun (JP) 1979-01-30 US disclosed