⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL413049 | 0.86 | LMNA (0.35) | — | |
| SCHEMBL576073 | 0.80 | — | — | |
| SCHEMBL3670237 | 0.79 | FFAR3 (0.38) | — | |
| SCHEMBL3671189 | 0.75 | HMGCR (0.48) | — | |
| Ethylene Glycol SCHEMBL18065060 | 0.74 | GRIK1 (0.32) | — | |
| SCHEMBL50602 | 0.73 | LMNA (0.40) | — | |
| SCHEMBL13851232 | 0.72 | — | — | |
| SCHEMBL26309616 | 0.72 | TSHR (0.39) | — | |
| Propene SCHEMBL28992525 | 0.70 | GRIK1 (0.31) | — | |
| SCHEMBL17916343 | 0.69 | FAAH (0.37) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11822240-B2 | Resist composition and method of forming resist pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11762288-B2 | Resist composition, method of forming resist pattern, and acid diffusion-controlling agent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-19 | — | — | US | disclosed |
| US-8400777-B2 | Electronic member, electronic part and manufacturing method therefor | HITACHI, LTD. (JP) | 2013-03-19 | — | — | US | disclosed |
| US-20100195292-A1 | ELECTRONIC MEMBER, ELECTRONIC PART AND MANUFACTURING METHOD THEREFOR | HITACHI, LTD. | 2010-08-05 | — | — | US | disclosed |