⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3680720 | 0.97 | SIGMAR1 (0.42) | — | |
| SCHEMBL453071 | 0.97 | SIGMAR1 (0.42) | — | |
| SCHEMBL20609443 | 0.94 | — | — | |
| SCHEMBL3924280 | 0.87 | — | — | |
| SCHEMBL10305516 | 0.79 | DPP4 (0.43) | — | |
| SCHEMBL3901737 | 0.77 | — | — | |
| SCHEMBL12262022 | 0.77 | — | — | |
| SCHEMBL8152967 | 0.77 | — | — | |
| SCHEMBL525855 | 0.77 | — | — | |
| SCHEMBL14733293 | 0.77 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114805795-A | Preparation method and application of acylamino polyaspartic acid ester | 浙江科技学院 | 2022-07-29 | — | — | CN | claimed |
| CN-111303368-B | Water-based polyaspartic acid ester resin and preparation method thereof | 深圳飞扬骏研新材料股份有限公司 | 2021-09-17 | — | — | CN | claimed |
| CN-109096132-B | Fluorine-containing polyaspartic acid ester resin and synthesis method thereof | 深圳飞扬骏研新材料股份有限公司 | 2021-04-16 | — | — | CN | claimed |
| CN-114805795-A | Preparation method and application of acylamino polyaspartic acid ester | 浙江科技学院 | 2022-07-29 | — | — | CN | disclosed |
| CN-109096132-B | Fluorine-containing polyaspartic acid ester resin and synthesis method thereof | 深圳飞扬骏研新材料股份有限公司 | 2021-04-16 | — | — | CN | disclosed |
| EP-1426392-B1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL CO (JP) | 2010-02-24 | — | — | EP | disclosed |
| US-6960640-B2 | Composition for optical material | MITSUBISHI GAS CHEMICAL CO., LTD. (JP) | 2005-11-01 | — | — | US | disclosed |
| US-20040147708-A1 | Composition for optical material | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-07-29 | — | — | US | disclosed |
| EP-1426392-A1 | COMPOSITION FOR OPTICAL MATERIAL | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2004-06-09 | — | — | EP | disclosed |