Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL5617772 | 1.00 | — | — | |
| Hydrochloric Acid SCHEMBL3522595 | 0.82 | — | — | |
| Bromide SCHEMBL11207426 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL10430970 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL18529907 | 0.82 | — | — | |
| Bromide SCHEMBL11407803 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL10596700 | 0.82 | — | — | |
| Ammonia Solution, Strong SCHEMBL411798 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL9496122 | 0.82 | — | — | |
| Hydrochloric Acid SCHEMBL28224096 | 0.82 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 47457 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12642024-B2 | Plasma processing method | HITACHI HIGH-TECH CORPORATION (JP) | 2026-05-26 | — | — | US | claimed |
| CN-116874491-B | N-protected pyrrolotriazine carbon glycoside compound and preparation method thereof | Shenzhen Antai weishengwu Pharmaceutical Co.,Ltd. (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12642023-B2 | Plasma etching processes | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-26 | — | — | US | claimed |
| CN-122085619-A | Photoetching method for realizing integration of chip and modulation disc | — | 2026-05-26 | — | — | CN | claimed |
| CN-122082158-A | Preparation method of silicon carbide fiber with in-situ boron nitride coating on surface | — | 2026-05-26 | — | — | CN | claimed |
| CN-122080579-A | Epoxy resin composite material and preparation method and application thereof | — | 2026-05-26 | — | — | CN | claimed |
| CN-120749022-B | Etching method of semiconductor device | 北京集成电路装备创新中心有限公司 | 2026-05-22 | — | — | CN | claimed |
| WO-2026106608-A1 | METAL-CONTAINING MATERIAL ETCH METHODS | APPLIED MATERIALS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| WO-2026106606-A1 | SELECTIVE REMOVAL OF METAL-AND-CARBON-CONTAINING MATERIALS | APPLIED MATERIALS, INC. (US) | 2026-05-21 | — | — | WO | claimed |
| US-20260140283-A1 | METHOD OF DEVELOPING ANTIREFLECTION COATINGS VIA PLASMA ETCHING | TIPD LLC (US) | 2026-05-21 | — | — | US | claimed |
| US-4001303-A | BORON COMPOUND; COMPOUNDS, 5; COMPOUNDS, 6; CATALYSTS | BAYER AKTIENGESELLSCHAFT (DT) | 1977-01-04 | — | — | US | claimed |
| US-3998875-A | PROCESS OF PREPARING 5-FLUORO-2-METHYL-1-(PARAMETHYLSULFINYLBENZYLIDENE)-INDENYL-3-ACETIC ACID | MERCK & CO., INC. (US) | 1976-12-21 | — | — | US | claimed |
| US-3996120-A | Laser-induced photochemical enrichment of boron isotopes | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE SECRETARY OF COMMERCE (US) | 1976-12-07 | — | — | US | claimed |
| US-3993732-A | REACTION WITH HYDROGEN CHLORIDE; BORIC ACID, BORON TRICHLORIDE | THE UNITED STATES OF AMERICA AS REPRESENTED BY THE UNITED STATES ENERGY RESEARCH AND DEVELOPMENT ADMINISTRATION (US) | 1976-11-23 | — | — | US | claimed |
| US-3989750-A | LEWIS ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1976-11-02 | — | — | US | claimed |
| US-3989882-A | Process for preparing an alternating copolymer of a conjugated vinyl compound and an olefinic unsaturated compound | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1976-11-02 | — | — | US | claimed |
| US-3985917-A | Method of depositing material on a heated substrate | AVCO CORPORATION (US) | 1976-10-12 | — | — | US | claimed |
| US-3979500-A | Preparation of finely-divided refractory powders of groups III-V metal borides, carbides, nitrides, silicides and sulfides | PPG INDUSTRIES, INC. (US) | 1976-09-07 | — | — | US | claimed |
| US-3957732-A | ALTERNATING COPOLYMERS HAVING FUNCTIONAL GROUP AND PROCESS FOR PRODUCING SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JA) | 1976-05-18 | — | — | US | claimed |
| US-3951709-A | \"COLD\" PLASMA ETCHING | LFE CORPORATION (US) | 1976-04-20 | — | — | US | claimed |