⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2286939 | 0.76 | — | — | |
| SCHEMBL2712241 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL7351253 | 0.74 | IDO1 (0.35) | — | |
| SCHEMBL2712240 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL2714034 | 0.74 | ALDH1A1 (0.31) | — | |
| SCHEMBL3675425 | 0.73 | — | — | |
| SCHEMBL10220 | 0.69 | — | — | |
| SCHEMBL2290290 | 0.69 | — | — | |
| SCHEMBL12253292 | 0.69 | LMNA (0.30) | — | |
| SCHEMBL12253293 | 0.69 | LMNA (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 27 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11912904-B2 | Adhesive compositions | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2024-02-27 | — | — | US | disclosed |
| US-11912891-B2 | Coatings with solar reflective properties | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2024-02-27 | — | — | US | disclosed |
| WO-2024023191-A1 | COLLOIDAL SILICA-BONDED MGO-CONTAINING REFRACTORY CASTABLES | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2024-02-01 | — | — | WO | disclosed |
| EP-4311817-A1 | COLLOIDAL SILICA-BONDED MGO-CONTAINING REFRACTORY CASTABLES | Nouryon Chemicals International B.V. (NL) | 2024-01-31 | — | — | EP | disclosed |
| US-20210363402-A1 | COMPOSITION AND METHOD FOR WATER AND GAS SHUT-OFF IN SUBTERRANEAN FORMATIONS | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2021-11-25 | — | — | US | disclosed |
| EP-3908638-A1 | STAIN RESISTANT COATING | Nouryon Chemicals International B.V. (NL) | 2021-11-17 | — | — | EP | disclosed |
| US-20210332252-A1 | STAIN RESISTANT COATING | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2021-10-28 | — | — | US | disclosed |
| US-20210139753-A1 | ADHESIVE COMPOSITIONS | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2021-05-13 | — | — | US | disclosed |
| EP-3814443-A1 | ADHESIVE COMPOSITIONS | Nouryon Chemicals International B.V. (NL) | 2021-05-05 | — | — | EP | disclosed |
| US-20210071010-A1 | COATINGS WITH SOLAR REFLECTIVE PROPERTIES | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2021-03-11 | — | — | US | disclosed |
| US-20180327648-A1 | COMPOSITION AND METHOD FOR WATER AND GAS SHUT-OFF IN SUBTERRANEAN FORMATIONS | NOURYON CHEMICALS INTERNATIONAL B.V. (NL) | 2018-11-15 | — | — | US | disclosed |
| US-9028683-B2 | Packing material with excellent hydrophilicity and process for producing the same | TOSOH CORPORATION (JP) | 2015-05-12 | — | — | US | disclosed |
| US-8304501-B2 | Composition containing silsesquioxane and silsesquioxane-containing hydroxyalkyl cellulose resin composition | NIPPON SODA CO., LTD. (JP) | 2012-11-06 | — | — | US | disclosed |
| US-20100280161-A1 | COMPOSITION CONTAINING SILSESQUIOXANE AND SILSESQUIOXANE-CONTAINING HYDROXYALKYL CELLULOSE RESIN COMPOSITION | Nippon Soda Ltd. (JP) | 2010-11-04 | — | — | US | disclosed |
| EP-1889857-B1 | NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME | TOSOH CORP (JP) | 2010-07-21 | — | — | EP | disclosed |
| US-20100029914-A1 | NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME | TOSOH CORPORATION (JP) | 2010-02-04 | — | — | US | disclosed |
| EP-1889857-A1 | NOVEL PACKING MATERIAL WITH EXCELLENT HYDROPHILICITY AND PROCESS FOR PRODUCING THE SAME | Tosoh Corporation (JP) | 2008-02-20 | — | — | EP | disclosed |
| US-7235619-B2 | Silsesquioxane derivative | CHISSO CORPORATION (JP) | 2007-06-26 | — | — | US | disclosed |
| US-20050215807-A1 | Silsesquioxane derivative | JNC CORPORATION (JP) | 2005-09-29 | — | — | US | disclosed |
| US-20040030084-A1 | Production process for silsesquioxane derivative and silsesquioxane derivative | JNC CORPORATION (JP) | 2004-02-12 | — | — | US | disclosed |