Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PKM | P14618 | 2/20 | 0.61 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.61 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.61 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.49 |
| ▸ | MEN1 | O00255 | 3/20 | 0.49 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.48 |
| ▸ | GAA | P10253 | 2/20 | 0.48 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.46 |
| ▸ | MAOA | P21397 | 1/20 | 0.46 |
| ▸ | HTR3A | P46098 | 1/20 | 0.46 |
| ▸ | HRH3 | Q9Y5N1 | 1/20 | 0.46 |
| ▸ | ESR1 | P03372 | 2/20 | 0.45 |
| ▸ | CHRM1 | P11229 | 1/20 | 0.45 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.45 |
| ▸ | KDR | P35968 | 1/20 | 0.45 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.44 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1953298 | 0.85 | MAPK1 (0.73) | PKMMAPK1HSD17B10KMT2AALDH1A1 | |
| SCHEMBL59872 | 0.84 | HSD17B10 (0.60) | PKMMAPK1HSD17B10KMT2AMEN1 | |
| SCHEMBL148292 | 0.84 | ALDH1A1 (0.64) | MAPK1KMT2AMEN1ALDH1A1KDM4E | |
| Ethane SCHEMBL27801588 | 0.83 | HSD17B10 (0.58) | PKMMAPK1HSD17B10KMT2AMEN1 | |
| SCHEMBL65692 | 0.80 | CA12 (0.61) | MAPK1KMT2AMEN1ALDH1A1GAA | |
| SCHEMBL7601276 | 0.80 | ALDH1A1 (0.63) | MAPK1ALDH1A1GAATSHRCYP2D6 | |
| SCHEMBL4397809 | 0.80 | MAPT (0.47) | PKMMAPK1HSD17B10KMT2AMEN1 | |
| SCHEMBL1953300 | 0.79 | MAPK1 (0.65) | PKMMAPK1HSD17B10KMT2AALDH1A1 | |
| Formic Acid SCHEMBL22719985 | 0.79 | MAPK1 (0.65) | PKMMAPK1HSD17B10KMT2AALDH1A1 | |
| SCHEMBL17984534 | 0.79 | MAPK1 (0.65) | PKMMAPK1HSD17B10KMT2AALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 56 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116589640-A | Photocurable resin composition, ink and coating | 株式会社大阪曹達 | 2023-08-15 | — | — | CN | disclosed |
| EP-3438166-B1 | RESIN COMPOSITE FILM INCLUDING CELLULOSE MICROFIBER LAYER | ASAHI CHEMICAL IND (JP) | 2021-12-15 | — | — | EP | disclosed |
| EP-3199701-B1 | THIN-FILM SHEET INCLUDING CELLULOSE FINE-FIBER LAYER | ASAHI CHEMICAL IND (JP) | 2021-10-27 | — | — | EP | disclosed |
| CN-108884251-B | Resin composite film comprising cellulose microfiber layer | 旭化成株式会社 | 2021-04-27 | — | — | CN | disclosed |
| CN-111770938-A | Photocurable resin composition, ink, and coating material | 株式会社大阪曹達 | 2020-10-13 | — | — | CN | disclosed |
| US-10703070-B2 | Resin composite film including cellulose microfiber layer | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2020-07-07 | — | — | US | disclosed |
| CN-104950575-B | Radiation-sensitive resin composition, method for forming spacer and interlayer insulating film for display element, and display element | JSR株式会社 | 2020-01-31 | — | — | CN | disclosed |
| CN-110644290-A | Film sheet comprising cellulose microfine fiber layer | 旭化成株式会社 | 2020-01-03 | — | — | CN | disclosed |
| EP-3363645-B1 | PRETREATMENT OF UV CURED INK UNDER-LAYERS | XEROX CORP (US) | 2019-10-23 | — | — | EP | disclosed |
| CN-107075804-B | Film sheet comprising cellulose microfine fiber layer | 旭化成株式会社 | 2019-09-27 | — | — | CN | disclosed |
| US-7282323-B2 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2007-10-16 | — | — | US | disclosed |
| EP-1775316-A1 | POLYAMIDE | Asahi Kasei EMD Corporation (JP) | 2007-04-18 | — | — | EP | disclosed |
| US-20050244739-A1 | Highly heat-resistant, negative-type photosensitive resin composition | ASAHI KASEI EMD CORPORATION (JP) | 2005-11-03 | — | — | US | disclosed |
| EP-1536286-A1 | HIGHLY HEAT-RESISTANT, NEGATIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION | Asahi Kasei EMD Corporation (JP) | 2005-06-01 | — | — | EP | disclosed |
| CN-1135439-C | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | 佳能株式会社 | 2004-01-21 | — | — | CN | disclosed |
| EP-0859286-B1 | Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus | CANON KK (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6004710-A | COMPRISING A SUPPORT AND A PHOTOSENSITIVE LAYER AND A PROTECTIVE LAYER DISPOSED IN THIS ORDER ON THE SUPPORT, WHEREIN THE PROTECTIVE LAYER COMPRISES AN APPLIED AND CURED RESIN COMPONENT; DURABILITY | CANON KABUSHIKI KAISHA (JP) | 1999-12-21 | — | — | US | disclosed |
| CN-1195790-A | Electrophotographic photosensitive member, process cartridge, and electrophotographic apparatus | CANON KK (JP) | 1998-10-14 | — | — | CN | disclosed |
| EP-0859286-A1 | Electrophotographic photosensitive member, process cartridge and electrophotographic apparatus | CANON KABUSHIKI KAISHA (JP) | 1998-08-19 | — | — | EP | disclosed |
| US-5262277-A | Light sensitive elements for electrical thick films with heat resistance | HITACHI CHEMICAL COMPANY, INC. (JP) | 1993-11-16 | — | — | US | disclosed |