SCHEMBL367757

SCHEMBL367757

NOP(=O)(O)CCC(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GRM8 O00222 1/20 0.42
GRM6 O15303 1/20 0.42
GRM7 Q14831 1/20 0.42
GRM4 Q14833 1/20 0.42
FOLH1 Q04609 5/20 0.36
LMNA P02545 2/20 0.36
ALKBH5 Q6P6C2 1/20 0.36
SUCNR1 Q9BXA5 1/20 0.36
EGLN1 Q9GZT9 1/20 0.36
TSHR P16473 2/20 0.35
CTH P32929 1/20 0.35
CBS P35520 1/20 0.35
THPO P40225 1/20 0.35
MEN1 O00255 1/20 0.35
HPGD P15428 1/20 0.35
BLM P54132 1/20 0.35
KMT2A Q03164 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
CTSC P53634 1/20 0.34
APEX1 P27695 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL234493 0.88 LMNA (0.43) GRM8GRM6GRM7GRM4FOLH1
SCHEMBL453385 0.86 LMNA (0.48) FOLH1LMNATSHRMEN1BLM
SCHEMBL7172938 0.85 TSHR (0.50) LMNATSHRMEN1BLMKMT2A
SCHEMBL27861340 0.77 PPARD (0.30)
SCHEMBL8622494 0.76 ALDH1A1 (0.41) GRM8GRM6GRM7GRM4FOLH1
SCHEMBL5060575 0.76 GRM8 (0.38) GRM8GRM6GRM7GRM4FOLH1
SCHEMBL7761768 0.76 TSHR (0.31) LMNATSHRCTHCBSTHPO
SCHEMBL25698414 0.76 GRM8 (0.39) GRM8GRM6GRM7GRM4FOLH1
SCHEMBL3457874 0.75
SCHEMBL28304833 0.74 GRM8 (0.37) GRM8GRM6GRM7GRM4FOLH1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150307818-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECH MATERIALS (US) 2015-10-29 US claimed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US claimed
US-20150307818-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECH MATERIALS (US) 2015-10-29 US disclosed
US-9063431-B2 Aqueous cleaner for the removal of post-etch residues ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2015-06-23 US disclosed
US-20130296214-A1 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2013-11-07 US disclosed
EP-2593964-A2 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES Advanced Technology Materials, Inc. (US) 2013-05-22 EP disclosed
WO-2012009639-A9 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-05-24 WO disclosed
WO-2012009639-A2 AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2012-01-19 WO disclosed
US-20100261632-A1 NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF RESIDUE FROM A MICROELECTRONIC DEVICE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-10-14 US disclosed
WO-2010091045-A2 NON-FLUORIDE CONTAINING COMPOSITION FOR THE REMOVAL OF POLYMERS AND OTHER ORGANIC MATERIAL FROM A SURFACE ADVANCED TECHNOLOGY MATERIALS, INC. (US) 2010-08-12 WO disclosed
US-7690783-B2 Ink for inkjet printing, lithographic printing plate using it and method for making such plate FUJIFILM CORPORATION (JP) 2010-04-06 US disclosed
US-6953666-B1 Biomarkers for oxidative stress EMORY UNIVERSITY (US) 2005-10-11 US disclosed
US-6558873-B1 Interlayer containing a compound capable of forming a complex with aluminum and a photopolymerizable photosensitive layer containing a photopolymerization initiator, an addition polymerizable compound capable of complexing with aluminum FUJI PHOTO FILM CO., LTD. (JP) 2003-05-06 US disclosed
EP-1124985-A4 BIOMARKERS FOR OXIDATIVE STRESS UNIV EMORY (US) 2003-01-15 EP disclosed
EP-1124985-A1 BIOMARKERS FOR OXIDATIVE STRESS Emory University (US) 2001-08-22 EP disclosed
EP-1091251-A2 Lithographic printing plate precursor FUJI PHOTO FILM CO., LTD. (JP) 2001-04-11 EP disclosed
WO-2000028072-A9 BIOMARKERS FOR OXIDATIVE STRESS UNIV EMORY (US) 2000-09-21 WO disclosed
WO-2000028072-A1 BIOMARKERS FOR OXIDATIVE STRESS EMORY UNIVERSITY (US) 2000-05-18 WO disclosed
EP-0792146-A1 INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES HEMASURE, INC. (US) 1997-09-03 EP disclosed
WO-1997002028-A1 INACTIVATION OF PATHOGENS USING HYDROXYMETHYLAMINES HEMASURE, INC. (US) 1997-01-23 WO disclosed