SCHEMBL3680593

SCHEMBL3680593

N[C]1CCCC(N)C1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5433511 0.82
SCHEMBL8402325 0.70
SCHEMBL17150410 0.70
SCHEMBL25269423 0.70
SCHEMBL496956 0.70
SCHEMBL25219266 0.70
SCHEMBL28748094 0.69 NOS1 (0.31)
SCHEMBL12964836 0.69 ADRA1A (0.37)
SCHEMBL19903877 0.67
SCHEMBL25018848 0.65

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-108366929-A The cosmetic method of keratin material is handled with maleic anhydride ethylenic polymer 莱雅公司 2018-08-03 CN claimed
CN-117836916-A Method for producing cured product, method for producing laminate, method for producing semiconductor device, treatment liquid, and resin composition 富士胶片株式会社 2024-04-05 CN disclosed
CN-115536785-A Delustered polyamide-PUD 路博润先进材料公司 2022-12-30 CN disclosed
CN-110603282-B Delustered polyamide-PUD 路博润先进材料公司 2022-11-08 CN disclosed
CN-110603282-A Delustered polyamide-PUD 路博润先进材料公司 2019-12-20 CN disclosed
CN-106413682-A Cosmetic process for attenuating wrinkles 莱雅公司 2017-02-15 CN disclosed
EP-2250222-B1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF NIPPON CATALYTIC CHEM IND (JP) 2015-12-23 EP disclosed
US-8647528-B2 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-02-11 US disclosed
US-20100270501-A1 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2010-10-28 US disclosed
CN-1558933-A Anthrapyridone compound, water-based magenta ink composition, and ink-jet recording method 日本化药株式会社 2004-12-29 CN disclosed