SCHEMBL3681610

SCHEMBL3681610

CCCCCCCCCCCCNC1CCCCCCC1

nearest known ligand 0.63

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ GNAI3 P08754 2/20 0.63
▸ GNAO1 P09471 2/20 0.63
▸ GNAI1 P63096 2/20 0.63
▸ EPHX1 P07099 11/20 0.56
▸ EPHX2 P34913 2/20 0.56
▸ S1PR4 O95977 2/20 0.54
▸ S1PR1 P21453 2/20 0.54
▸ S1PR3 Q99500 2/20 0.54
▸ S1PR5 Q9H228 1/20 0.54
▸ NAAA Q02083 1/20 0.50
▸ SIGMAR1 Q99720 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6063483 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801035 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801745 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801360 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801666 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL3692945 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL20975893 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL22472718 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL20991764 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL3687837 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4694606-A1 RADIO WAVE SHIELDING BODY AND ADHESIVE COMPOSITION Zeon Corporation (JP) 2026-02-11 — — EP disclosed
WO-2024204796-A1 RADIO WAVE SHIELDING BODY AND ADHESIVE COMPOSITION 日本ゼオン株式会社 2024-10-03 — — WO disclosed
EP-2250222-B1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF NIPPON CATALYTIC CHEM IND (JP) 2015-12-23 — — EP disclosed
US-8647528-B2 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-02-11 — — US disclosed
CN-101939383-B Water absorbent and its production process NIPPON CATALYTIC CHEM IND 2012-08-22 — — CN disclosed
CN-101939383-A Water absorbent and its production process NIPPON CATALYTIC CHEM IND 2011-01-05 — — CN disclosed
EP-2250222-A1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF Nippon Shokubai Co., Ltd. (JP) 2010-11-17 — — EP disclosed
US-20100270501-A1 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2010-10-28 — — US disclosed
WO-2009110645-A1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2009-09-11 — — WO disclosed
US-7504001-B2 Method for producing paper and agent for improving yield SEIKO PMC CORPORATION (JP) 2009-03-17 — — US disclosed
US-20060011317-A1 Method for producing paper and agent for improving yield SEIKO PMC CORPORATION (JP) 2006-01-19 — — US disclosed
EP-1500745-A1 METHOD FOR PRODUCING PAPER AND AGENT FOR IMPROVING YIELD Seiko PMC Corporation (JP) 2005-01-26 — — EP disclosed
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