SCHEMBL3687837

SCHEMBL3687837

CCCCCCCCNC1CCCCCCC1

nearest known ligand 0.63

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
▸ GNAI3 P08754 2/20 0.63
▸ GNAO1 P09471 2/20 0.63
▸ GNAI1 P63096 2/20 0.63
▸ EPHX1 P07099 11/20 0.56
▸ EPHX2 P34913 2/20 0.56
▸ S1PR4 O95977 2/20 0.54
▸ S1PR1 P21453 2/20 0.54
▸ S1PR3 Q99500 2/20 0.54
▸ S1PR5 Q9H228 1/20 0.54
▸ NAAA Q02083 1/20 0.50
▸ SIGMAR1 Q99720 2/20 0.49

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6063483 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801035 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL3681610 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801745 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801360 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL9801666 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL3692945 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL20975893 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL22472718 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2
SCHEMBL20991764 1.00 GNAI3 (0.63) GNAI3GNAO1GNAI1EPHX1EPHX2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 136 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4694606-A1 RADIO WAVE SHIELDING BODY AND ADHESIVE COMPOSITION Zeon Corporation (JP) 2026-02-11 — — EP disclosed
EP-3404056-B1 METHOD FOR PRODUCING THERMOPLASTIC ELASTOMER COMPOSITION ZEON CORP (JP) 2025-06-11 — — EP disclosed
EP-3101065-B1 CROSS-LINKABLE NITRILE RUBBER COMPOSITION AND CROSS-LINKED RUBBER ZEON CORP (JP) 2025-05-28 — — EP disclosed
US-12202923-B2 Nitrile-group-containing copolymer rubber ZEON CORPORATION (JP) 2025-01-21 — — US disclosed
WO-2024204796-A1 RADIO WAVE SHIELDING BODY AND ADHESIVE COMPOSITION 日本ゼオン株式会社 2024-10-03 — — WO disclosed
CN-114555660-B Nitrile group-containing copolymer rubber 日本瑞翁株式会社 2024-06-11 — — CN disclosed
EP-3305817-B2 NITRILE GROUP CONTAINING, HIGHLY SATURATED COPOLYMER RUBBER ZEON CORP (JP) 2023-12-27 — — EP disclosed
EP-3744739-B1 METHOD FOR PRODUCING CARBOXY GROUP-CONTAINING HYDROGENATED NITRILE RUBBER ZEON CORP (JP) 2023-12-27 — — EP disclosed
WO-2023165854-A1 SUBSTITUTED ISOXAZOLINE DERIVATIVES BASF SE (DE) 2023-09-07 — — WO disclosed
US-11639408-B2 Nitrile group-containing copolymer rubber ZEON CORPORATION (JP) 2023-05-02 — — US disclosed
EP-2250222-B1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF NIPPON CATALYTIC CHEM IND (JP) 2015-12-23 — — EP disclosed
US-20150246991-A1 CROSS-LINKABLE RUBBER COMPOSITION AND CROSS-LINKED RUBBER ZEON CORPORATION (JP) 2015-09-03 — — US disclosed
EP-2902437-A1 CROSSLINKABLE RUBBER COMPOSITION AND CROSSLINKED RUBBER Zeon Corporation (JP) 2015-08-05 — — EP disclosed
US-8647528-B2 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2014-02-11 — — US disclosed
EP-2250222-A1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF Nippon Shokubai Co., Ltd. (JP) 2010-11-17 — — EP disclosed
US-20100270501-A1 Water absorbing agent and production method thereof NIPPON SHOKUBAI CO., LTD. (JP) 2010-10-28 — — US disclosed
WO-2009110645-A1 WATER ABSORBING AGENT AND PRODUCTION METHOD THEREOF NIPPON SHOKUBAI CO., LTD. (JP) 2009-09-11 — — WO disclosed
US-7504001-B2 Method for producing paper and agent for improving yield SEIKO PMC CORPORATION (JP) 2009-03-17 — — US disclosed
US-20060011317-A1 Method for producing paper and agent for improving yield SEIKO PMC CORPORATION (JP) 2006-01-19 — — US disclosed
EP-1500745-A1 METHOD FOR PRODUCING PAPER AND AGENT FOR IMPROVING YIELD Seiko PMC Corporation (JP) 2005-01-26 — — EP disclosed
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