SCHEMBL3687652

SCHEMBL3687652

C[SiH](C)O[Si](C)(C)O[SiH3]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4273351 0.86
SCHEMBL1146455 0.84
SCHEMBL133734 0.79
SCHEMBL11747677 0.77
SCHEMBL187714 0.73
SCHEMBL5916314 0.71
SCHEMBL11950506 0.71
SCHEMBL4761256 0.71
SCHEMBL9178213 0.71
SCHEMBL21112950 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3507104-B1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU BRIDGESTONE CORP (JP) 2024-03-27 EP disclosed
US-10975178-B2 Production of cis-1,4-polydienes with multiple silane functional groups prepared by in-situ hydrosilylation of polymer cement BRIDGESTONE CORPORATION (JP) 2021-04-13 US disclosed
US-20190211120-A1 Production Of Cis-1,4-Polydienes With Multiple Silane Functional Groups Prepared By In-Situ Hydrosilylation Of Polymer Cement BRIDGESTONE CORPORATION (JP) 2019-07-11 US disclosed
EP-3507104-A1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BYIN-SITU Bridgestone Corporation (JP) 2019-07-10 EP disclosed
WO-2018045291-A1 PRODUCTION OF CIS-1,4-POLYDIENES WITH MULTIPLE SILANE FUNCTIONAL GROUPS PREPARED BY IN-SITU HYDROSILYLATION OF POLYMER CEMENT BRIDGESTONE CORPORATION (JP) 2018-03-08 WO disclosed
EP-2520579-B1 A silicone compound, photocurable liquid ink using the silicone compound, and method of manufacturing the ink RICOH CO LTD (JP) 2015-08-05 EP disclosed
US-8871861-B2 Silicone compound, photocurable liquid ink using the silicone compound, and method of manufacturing the ink RICOH COMPANY, LTD. (JP) 2014-10-28 US disclosed
US-20130284196-A1 Applicator Assembly for Applying a Composition THE PROCTER & GAMBLE COMPANY (US) 2013-10-31 US disclosed
US-20120283378-A1 A SILICONE COMPOUND, PHOTOCURABLE LIQUID INK USING THE SILICONE COMPOUND, AND METHOD OF MANUFACTURING THE INK RICOH COMPANY, LTD., (JP) 2012-11-08 US disclosed
EP-2520579-A2 A silicone compound, photocurable liquid ink using the silicone compound, and method of manufacturing the ink Ricoh Company, Ltd. (JP) 2012-11-07 EP disclosed
CN-1981069-B Composition containing siloxane compound and phenol compound ADEKA CORP 2010-09-08 CN disclosed
US-7737291-B2 2,4,6,8-tetramethylcyclotetrasiloxane and stabilizer used as a material for thin film formation by chemical vapor deposition, or atomic layer deposition ADEKA CORPORATION (JP) 2010-06-15 US disclosed
US-20070232821-A1 Composition Containing Siloxane Compound and Phenol Compound ADEKA CORPORATION (JP) 2007-10-04 US disclosed
CN-1981069-A Composition containing siloxane compound and phenol compound ADEKA CORP (JP) 2007-06-13 CN disclosed