Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.48 |
| ▸ | MAPT | P10636 | 7/20 | 0.48 |
| ▸ | GAA | P10253 | 1/20 | 0.48 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | FLT1 | P17948 | 1/20 | 0.41 |
| ▸ | FLT4 | P35916 | 1/20 | 0.41 |
| ▸ | KDR | P35968 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | PLA2G7 | Q13093 | 1/20 | 0.40 |
| ▸ | HTT | P42858 | 2/20 | 0.39 |
| ▸ | LMNA | P02545 | 1/20 | 0.39 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.39 |
| ▸ | NPY1R | P25929 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL36921 | 1.00 | KMT2A (0.50) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL36199 | 0.94 | TDP1 (0.45) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL36200 | 0.94 | TDP1 (0.45) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL92016 | 0.90 | KDM4E (0.49) | KMT2AMEN1KDM4EMAPTTDP1 | |
| SCHEMBL7976575 | 0.90 | KDM4E (0.49) | KMT2AMEN1KDM4EMAPTTDP1 | |
| SCHEMBL10673694 | 0.87 | KDM4E (0.42) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL10673690 | 0.87 | KDM4E (0.42) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL10083957 | 0.87 | MAPT (0.49) | KMT2AKDM4EMAPTGAATDP1 | |
| SCHEMBL10643371 | 0.86 | PLA2G7 (0.41) | KMT2AMEN1KDM4EMAPTGAA | |
| SCHEMBL10643361 | 0.86 | PLA2G7 (0.41) | KMT2AMEN1KDM4EMAPTGAA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 737 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11884839-B2 | Acetal-protected silanol group-containing polysiloxane composition | NISSAN CHEMICAL CORPORATION (JP) | 2024-01-30 | — | — | US | disclosed |
| US-20230176479-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-3896522-B1 | PRODUCTION METHOD FOR SEMICONDUCTOR SUBSTRATE | TOKYO OHKA KOGYO CO LTD (JP) | 2023-05-03 | — | — | EP | disclosed |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-04-27 | — | — | US | disclosed |
| EP-4167028-A1 | NEGATIVE RESIST FILM LAMINATE AND PATTERN FORMATION METHOD | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-04-19 | — | — | EP | disclosed |
| CN-115885217-A | Negative resist film laminate and pattern forming method | 信越化学工业株式会社 | 2023-03-31 | — | — | CN | disclosed |
| CN-108107676-B | Chemically amplified positive resist film laminate and pattern formation method | 信越化学工业株式会社 | 2023-02-21 | — | — | CN | disclosed |
| US-11561472-B2 | Radiation sensitive composition | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2023-01-24 | — | — | US | disclosed |
| US-11460774-B2 | Photosensitive resin composition, photosensitive dry film, and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-10-04 | — | — | US | disclosed |
| CN-114600045-A | Photosensitive resin composition, photosensitive dry film and pattern forming method | 信越化学工业株式会社 | 2022-06-07 | — | — | CN | disclosed |
| US-6077644-A | Positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-06-20 | — | — | US | disclosed |
| US-6063953-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-05-16 | — | — | US | disclosed |
| US-6022666-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2000-02-08 | — | — | US | disclosed |
| US-5929271-A | Compounds for use in a positive-working resist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-07-27 | — | — | US | disclosed |
| US-5902713-A | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1999-05-11 | — | — | US | disclosed |
| EP-0780729-A1 | Chemical-sensitization photoresist composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 1997-06-25 | — | — | EP | disclosed |
| EP-0241423-B1 | PROCESS FOR THE PRODUCTION OF POSITIVE IMAGES | CIBA-GEIGY AG (CH) | 1993-09-15 | — | — | EP | disclosed |
| EP-0139609-B1 | PROCESS FOR CURING ACID-CURABLE LACQUERS | CIBA-GEIGY AG (CH) | 1987-02-04 | — | — | EP | disclosed |
| US-4540598-A | LATENT OXIME SULFONATE CATALYSTS | CIBA-GEIGY CORPORATION (US) | 1985-09-10 | — | — | US | disclosed |
| EP-0139609-A1 | Process for curing acid-curable lacquers | CIBA-GEIGY AG (CH) | 1985-05-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-11561472-B2 | Radiation sensitive composition | RER1, RAD1, RAD51 | KMT2A 853/4885MEN1 2273/4885KDM4E 1103/4885 |
| US-20230125270-A1 | RADIATION SENSITIVE COMPOSITION | XRCC6, RAD50, XRCC5 | KMT2A 3292/4885MEN1 194/4885KDM4E 1808/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.