SCHEMBL3694476

SCHEMBL3694476

COC(=O)C1C2CC(C(=O)O)C(C2)C1C(=O)O

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 1/20 0.44
PTPN1 P18031 1/20 0.44
PPP1CC P36873 1/20 0.44
POLB P06746 1/20 0.39
CHRNB2 P17787 1/20 0.35
CHRNB4 P30926 1/20 0.35
CHRNA3 P32297 1/20 0.35
CHRNA7 P36544 1/20 0.35
CHRNA4 P43681 1/20 0.35
SLC6A3 Q01959 2/20 0.35
MEN1 O00255 1/20 0.35
ALDH1A1 P00352 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2C9 P11712 1/20 0.35
CYP2C19 P33261 1/20 0.35
KMT2A Q03164 1/20 0.35
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3694479 0.89 PPM1B (0.41) PPM1BPTPN1PPP1CCPOLBCHRNB2
SCHEMBL3782939 0.85 GABRR1 (0.33) POLB
SCHEMBL13170557 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL13170561 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL3791279 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL13170558 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL13170560 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL3137346 0.84 GABRR1 (0.39) POLBMEN1ALDH1A1CYP2C9CYP2C19
SCHEMBL15087036 0.82 GABRR1 (0.34) POLBALDH1A1
SCHEMBL3694474 0.82 CHRNB2 (0.38) PPM1BPTPN1PPP1CCCHRNB2CHRNB4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9295981-B2 Method for producing ester compound by reacting an unsaturated organic compound and a formic acid ester in the presence of a catalyst system containing a ruthenium compound, a cobalt compound and a halide salt HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-03-29 US disclosed
EP-2460785-A1 METHOD FOR PRODUCING ESTER COMPOUND Hitachi Chemical Company, Ltd. (JP) 2012-06-06 EP disclosed
US-20120123146-A1 METHOD FOR PRODUCING ESTER COMPOUND HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-05-17 US disclosed