SCHEMBL3694479

SCHEMBL3694479

COC(=O)C1CC2CC1C(C(=O)O)C2C(=O)O

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PPM1B O75688 1/20 0.41
PTPN1 P18031 1/20 0.41
PPP1CC P36873 1/20 0.41
CHRNB2 P17787 1/20 0.35
CHRNB4 P30926 1/20 0.35
CHRNA3 P32297 1/20 0.35
CHRNA7 P36544 1/20 0.35
CHRNA4 P43681 1/20 0.35
POLB P06746 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
TSHR P16473 1/20 0.35
MAPK1 P28482 1/20 0.35
HSD17B10 Q99714 1/20 0.35
CHRM2 P08172 1/20 0.34
CHRM4 P08173 1/20 0.34
CHRM3 P20309 1/20 0.34
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3694476 0.89 PPM1B (0.44) PPM1BPTPN1PPP1CCCHRNB2CHRNB4
SCHEMBL3694474 0.86 CHRNB2 (0.38) PPM1BPTPN1PPP1CCCHRNB2CHRNB4
SCHEMBL3781317 0.86 CHRNB2 (0.38) PPM1BPTPN1PPP1CCCHRNB2CHRNB4
SCHEMBL8285099 0.83 PPM1B (0.42) PPM1BPTPN1PPP1CCCHRNB2CHRNB4
SCHEMBL13170558 0.80 GABRR1 (0.39) POLBALDH1A1
SCHEMBL13170561 0.80 GABRR1 (0.39) POLBALDH1A1
SCHEMBL13170560 0.80 GABRR1 (0.39) POLBALDH1A1
SCHEMBL3137346 0.80 GABRR1 (0.39) POLBALDH1A1
SCHEMBL13170557 0.80 GABRR1 (0.39) POLBALDH1A1
SCHEMBL3791279 0.80 GABRR1 (0.39) POLBALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9295981-B2 Method for producing ester compound by reacting an unsaturated organic compound and a formic acid ester in the presence of a catalyst system containing a ruthenium compound, a cobalt compound and a halide salt HITACHI CHEMICAL COMPANY, LTD. (JP) 2016-03-29 US disclosed
EP-2460785-A1 METHOD FOR PRODUCING ESTER COMPOUND Hitachi Chemical Company, Ltd. (JP) 2012-06-06 EP disclosed
US-20120123146-A1 METHOD FOR PRODUCING ESTER COMPOUND HITACHI CHEMICAL COMPANY, LTD. (JP) 2012-05-17 US disclosed