⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11684323 | 0.70 | — | — | |
| SCHEMBL8642651 | 0.67 | — | — | |
| SCHEMBL2790029 | 0.67 | — | — | |
| SCHEMBL3950485 | 0.64 | ALDH1A1 (0.39) | — | |
| 1,1-Dichloroethene SCHEMBL10338254 | 0.53 | — | — | |
| 1,1-Dichloroethene SCHEMBL979464 | 0.52 | — | — | |
| 1,1-Dichloroethene SCHEMBL244212 | 0.52 | — | — | |
| SCHEMBL916841 | 0.52 | — | — | |
| SCHEMBL1056805 | 0.52 | — | — | |
| SCHEMBL219724 | 0.52 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2452943-B1 | Method for producing alkoxy-substituted 1,2-Bis-Silyl-Ethanes | WACKER CHEMIE AG (DE) | 2013-07-10 | — | — | EP | disclosed |
| US-20120123143-A1 | METHOD FOR PRODUCING ALKOXY-SUBSTITUTED 1,2-BISSILYLETHANES | WACKER CHEMIE AG (DE) | 2012-05-17 | — | — | US | disclosed |
| EP-2452943-A1 | Method for producing alkoxy-substituted 1,2-Bis-Silyl-Ethanes | Wacker Chemie AG (DE) | 2012-05-16 | — | — | EP | disclosed |
| US-7556860-B2 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2009-07-07 | — | — | US | disclosed |
| US-20060216531-A1 | Laminate and method of forming the same, insulating film, and semiconductor device | JSR CORPORATION (JP) | 2006-09-28 | — | — | US | disclosed |
| EP-1679184-A1 | LAMINATE AND METHOD FOR FORMATION THEREOF, INSULATING FILM, SEMICONDUCTOR DEVICE, AND COMPOSITION FOR FORMING FILM | JSR Corporation (JP) | 2006-07-12 | — | — | EP | disclosed |