Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRBN | Q96SW2 | 2/20 | 0.41 |
| ▸ | CA2 | P00918 | 4/20 | 0.38 |
| ▸ | CA1 | P00915 | 3/20 | 0.38 |
| ▸ | MMP1 | P03956 | 3/20 | 0.38 |
| ▸ | MMP2 | P08253 | 3/20 | 0.38 |
| ▸ | MMP9 | P14780 | 3/20 | 0.38 |
| ▸ | MMP8 | P22894 | 3/20 | 0.38 |
| ▸ | MMP13 | P45452 | 3/20 | 0.38 |
| ▸ | F2 | P00734 | 4/20 | 0.35 |
| ▸ | PRSS1 | P07477 | 4/20 | 0.35 |
| ▸ | PRSS2 | P07478 | 4/20 | 0.35 |
| ▸ | PRSS3 | P35030 | 4/20 | 0.35 |
| ▸ | PKM | P14618 | 1/20 | 0.31 |
| ▸ | PKLR | P30613 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinimide SCHEMBL3689496 | 0.98 | CA2 (0.40) | CRBNCA2CA1MMP1MMP2 | |
| Trifluoromethanesulfonic Acid SCHEMBL218096 | 0.80 | CRBN (0.52) | CRBNPKMPKLR | |
| SCHEMBL30354089 | 0.79 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL23932 | 0.79 | CA2 (0.54) | CA2CA1MMP1MMP2MMP9 | |
| Fluoride SCHEMBL1995965 | 0.77 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6916713 | 0.77 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL24140 | 0.77 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL6912911 | 0.77 | CA2 (0.52) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3140314 | 0.77 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 | |
| SCHEMBL3139152 | 0.77 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-116693755-B | ArF photoresist film-forming polymer, preparation method thereof, photoresist prepared from polymer and application of polymer | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-116693755-A | ArF photoresist film-forming polymer, preparation method thereof, photoresist prepared from polymer and application of polymer | 瑞红(苏州)电子化学品股份有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-115536776-B | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-115685678-A | Star-shaped molecular glass film forming resin and photoresist and preparation method thereof | 南通林格橡塑制品有限公司 | 2023-02-03 | — | — | CN | disclosed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | disclosed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | disclosed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | disclosed |
| EP-1720063-B1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-1482361-B1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO (JP) | 2007-10-03 | — | — | EP | disclosed |
| EP-1720063-A1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7105272-B2 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20050130057-A1 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |