Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CRBN | Q96SW2 | 3/20 | 0.52 |
| ▸ | KIF11 | P52732 | 4/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.32 |
| ▸ | PKM | P14618 | 1/20 | 0.32 |
| ▸ | PKLR | P30613 | 1/20 | 0.32 |
| ▸ | NPC1 | O15118 | 1/20 | 0.30 |
| ▸ | MAPK13 | O15264 | 1/20 | 0.30 |
| ▸ | MAPK12 | P53778 | 1/20 | 0.30 |
| ▸ | MAPK11 | Q15759 | 1/20 | 0.30 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Succinimide SCHEMBL30302994 | 0.82 | CRBN (0.69) | CRBNPKMNPC1MAPK13MAPK12 | |
| Succinimide SCHEMBL27863987 | 0.82 | CRBN (0.69) | CRBNPKMNPC1MAPK13MAPK12 | |
| Succinimide SCHEMBL3700829 | 0.80 | CRBN (0.41) | CRBNPKMPKLR | |
| Succinimide SCHEMBL8613393 | 0.79 | CRBN (0.65) | CRBNPKMNPC1MAPK13MAPK12 | |
| Succinimide SCHEMBL3689496 | 0.78 | CA2 (0.40) | CRBNPKMPKLR | |
| Succinimide SCHEMBL216817 | 0.77 | CRBN (0.61) | CRBNALDH1A1L3MBTL1PKMNPC1 | |
| Succinimide SCHEMBL8613396 | 0.75 | CRBN (0.58) | CRBNALDH1A1PKMNPC1MAPK13 | |
| Succinimide SCHEMBL28449848 | 0.74 | CRBN (0.65) | CRBNKIF11NPC1MAPK13MAPK12 | |
| Trifluoroacetic Acid SCHEMBL1967871 | 0.73 | CRBN (0.55) | CRBNKIF11NPC1MAPK13MAPK12 | |
| Trifluoromethanesulfonic Acid SCHEMBL22283860 | 0.73 | LMNA (0.32) | ALDH1A1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 104 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6287747-B1 | CONTAINING ORGANOOXYGEN COMPOUNDS AND UNSATURATED COMPOUNDS | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-09-11 | — | — | US | claimed |
| US-6143465-A | Photosensitive polymer having cyclic backbone and resist composition comprising same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-11-07 | — | — | US | claimed |
| EP-0745633-B1 | Si containing high molecular compound and photosensitive resin composition | NEC CORP (JP) | 2000-08-02 | — | — | EP | claimed |
| US-6080524-A | Photosensitive polymer having cyclic backbone and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-06-27 | — | — | US | claimed |
| US-5723257-A | POLYVINYLSILSESQUIOXANES OR OTHER POLYSILOXANES | NEC CORPORATION (JP) | 1998-03-03 | — | — | US | claimed |
| EP-0745633-A2 | Si containing high molecular compound and photosensitive resin composition | NEC CORPORATION (JP) | 1996-12-04 | — | — | EP | claimed |
| WO-2026097702-A1 | PHOTOSENSITIVE COMPOSITION, METHOD FOR PREPARING PATTERN, CURED PRODUCT, AND ELECTRONIC COMPONENT | 江苏艾森半导体材料股份有限公司 | 2026-05-15 | — | — | WO | disclosed |
| CN-114942569-B | Photosensitive polymer and resist composition containing the same | OLAS有限公司 | 2025-05-02 | — | — | CN | disclosed |
| US-20230107659-A1 | COMPOSITION, LIGHT SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR MANUFACTURING CURED FILM | FUJIFILM CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| CN-114942569-A | Photosensitive polymer and resist composition containing the same | OLAS有限公司 | 2022-08-26 | — | — | CN | disclosed |
| CN-107544208-B | Negative photosensitive resin composition, spacer, protective film and liquid crystal display element | 奇美实业股份有限公司 | 2022-05-31 | — | — | CN | disclosed |
| US-20210155825-A1 | HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, AND COMPOUND AND RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-05-27 | — | — | US | disclosed |
| WO-2020204073-A1 | COMPOSITION FOR CURED-FILM FORMATION, WAVELENGTH CONVERSION FILM, LIGHT-EMITTING DISPLAY ELEMENT, AND METHOD FOR FORMING WAVELENGTH CONVERSION FILM | JSR株式会社 | 2020-10-08 | — | — | WO | disclosed |
| CN-1456580-A | Photosensitive polymer and amplified chemical photoresist agent composition containing it | SAMSUNG ELECTRONICS CO LTD (KR) | 2003-11-19 | — | — | CN | disclosed |
| US-6245482-B1 | HOMO- OR COPOLYMER CONTAINING BIS(TRIMETHYLSILYL)-2-PROPYL (METH)ACRYLATE UNITS; EXCIMER LASER PHOTOLITHOGRAPHY, DRY ETCHING RESISTANCE FOR A SHARP PHOTORESIST PATTERN AT HIGH ASPECT RATIO | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2001-06-12 | — | — | US | disclosed |
| EP-0745633-B1 | Si containing high molecular compound and photosensitive resin composition | NEC CORP (JP) | 2000-08-02 | — | — | EP | disclosed |
| US-6080524-A | Photosensitive polymer having cyclic backbone and resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-06-27 | — | — | US | disclosed |
| US-6051362-A | Silicon containing polymer and chemically amplified resist composition comprising the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2000-04-18 | — | — | US | disclosed |
| US-5723257-A | POLYVINYLSILSESQUIOXANES OR OTHER POLYSILOXANES | NEC CORPORATION (JP) | 1998-03-03 | — | — | US | disclosed |
| EP-0745633-A2 | Si containing high molecular compound and photosensitive resin composition | NEC CORPORATION (JP) | 1996-12-04 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20210155825-A1 | HARD-MASK FORMING COMPOSITION, METHOD FOR MANUFACTURING ELECTRONIC COMPONENT, AND COMPOUND AND RESIN | RER1, SEM1, POP1 | CRBN 716/4885KIF11 3410/4885ALDH1A1 2421/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.