Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GSK3B | P49841 | 1/20 | 0.47 |
| ▸ | CASP3 | P42574 | 1/20 | 0.46 |
| ▸ | CASP2 | P42575 | 1/20 | 0.46 |
| ▸ | CASP7 | P55210 | 1/20 | 0.46 |
| ▸ | CASP6 | P55212 | 1/20 | 0.46 |
| ▸ | CASP8 | Q14790 | 1/20 | 0.46 |
| ▸ | CA2 | P00918 | 10/20 | 0.38 |
| ▸ | CA1 | P00915 | 9/20 | 0.38 |
| ▸ | MMP1 | P03956 | 3/20 | 0.36 |
| ▸ | MMP2 | P08253 | 3/20 | 0.36 |
| ▸ | MMP9 | P14780 | 3/20 | 0.36 |
| ▸ | MMP8 | P22894 | 3/20 | 0.36 |
| ▸ | MMP13 | P45452 | 3/20 | 0.36 |
| ▸ | PARP1 | P09874 | 2/20 | 0.35 |
| ▸ | CES1 | P23141 | 1/20 | 0.34 |
| ▸ | LMNA | P02545 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 1/20 | 0.34 |
| ▸ | APAF1 | O14727 | 1/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Phthalimide SCHEMBL3702796 | 0.98 | GSK3B (0.48) | GSK3BCASP3CASP2CASP7CASP6 | |
| SCHEMBL703422 | 0.87 | PARP1 (0.54) | GSK3BCASP3CASP2CASP7CASP6 | |
| SCHEMBL701608 | 0.85 | PARP1 (0.56) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL220034 | 0.81 | GSK3B (0.60) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL31168291 | 0.81 | GSK3B (0.60) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL28219477 | 0.80 | GSK3B (0.54) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL3220884 | 0.75 | GSK3B (0.68) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL27968411 | 0.75 | GSK3B (0.75) | GSK3BCASP3CASP2CASP7CASP6 | |
| Phthalimide SCHEMBL29217853 | 0.75 | GSK3B (0.75) | GSK3BCASP3CASP2CASP7CASP6 | |
| SCHEMBL3137344 | 0.75 | CA2 (0.56) | CA2CA1MMP1MMP2MMP9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 32 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | claimed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | claimed |
| CN-114779577-A | Cyclodextrin inclusion compound molecular glass photoresist | 南通林格橡塑制品有限公司 | 2022-07-22 | — | — | CN | claimed |
| CN-114442429-A | Molecular glass photoresist of metallocene compound and preparation method thereof | 南通林格橡塑制品有限公司 | 2022-05-06 | — | — | CN | claimed |
| CN-110256655-A | A kind of tannic acid Quito official's epoxy resin and preparation method thereof and preparation can liquid alkali developing negative photoresist | 苏州瑞红电子化学品有限公司 | 2019-09-20 | — | — | CN | claimed |
| CN-108084331-B | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2019-08-16 | — | — | CN | claimed |
| CN-105566552-B | A kind of acrylate copolymer and its manufactured 248nm photoetching compositions | 江南大学 | 2019-05-17 | — | — | CN | claimed |
| CN-108084331-A | A kind of biology base film-forming resin and its photoresist of preparation | 江南大学 | 2018-05-29 | — | — | CN | claimed |
| CN-116693755-B | ArF photoresist film-forming polymer, preparation method thereof, photoresist prepared from polymer and application of polymer | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-115368494-B | Monomer copolymer containing hexafluoroisopropanol, preparation method thereof, chemical amplification type photoresist and application thereof | 瑞红(苏州)电子化学品股份有限公司 | 2024-03-29 | — | — | CN | disclosed |
| CN-116693755-A | ArF photoresist film-forming polymer, preparation method thereof, photoresist prepared from polymer and application of polymer | 瑞红(苏州)电子化学品股份有限公司 | 2023-09-05 | — | — | CN | disclosed |
| CN-115536776-B | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2023-08-29 | — | — | CN | disclosed |
| CN-115536776-A | Resin for photoresist, preparation method thereof and photoresist prepared from resin | 瑞红(苏州)电子化学品股份有限公司 | 2022-12-30 | — | — | CN | disclosed |
| CN-115368494-A | Hexafluoroisopropanol-containing monomer copolymer, preparation method thereof, chemical amplification type photoresist and application | 瑞红(苏州)电子化学品股份有限公司 | 2022-11-22 | — | — | CN | disclosed |
| EP-1720063-B1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO (JP) | 2010-04-07 | — | — | EP | disclosed |
| EP-1482361-B1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO (JP) | 2007-10-03 | — | — | EP | disclosed |
| EP-1720063-A1 | Resin containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-11-08 | — | — | EP | disclosed |
| US-7105272-B2 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2006-09-12 | — | — | US | disclosed |
| US-20050130057-A1 | Acid-degradable resin compositions containing ketene-aldehyde copolymer | NIPPON SODA CO., LTD. (JP) | 2005-06-16 | — | — | US | disclosed |
| EP-1482361-A1 | ACID-DEGRADABLE RESIN COMPOSITIONS CONTAINING KETENE-ALDEHYDE COPOLYMER | NIPPON SODA CO., LTD. (JP) | 2004-12-01 | — | — | EP | disclosed |