SCHEMBL37020

SCHEMBL37020

O=C(O)CC(O)CS

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL112368 0.81 SLC22A6 (1.00)
SCHEMBL30496763 0.81 SLC22A6 (1.00)
Thioglycolic Acid SCHEMBL6243518 0.79 LMNA (0.45)
SCHEMBL6733935 0.78 SLC22A6 (0.93)
SCHEMBL29060947 0.78 SLC22A6 (0.93)
SCHEMBL10423093 0.78 SLC22A6 (0.93)
SCHEMBL28596753 0.78 SLC22A6 (0.93)
SCHEMBL26138089 0.75 SLC22A6 (0.75)
SCHEMBL6453593 0.75 SLC22A6 (0.75)
SCHEMBL12165481 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 96 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2313442-B1 DISPERSING AGENT AND ITS USE EVONIK DEGUSSA GMBH (DE) 2014-09-03 EP claimed
EP-2049574-B1 USE OF A SULFUR COMPOUND FOR PREPARING HALOGEN-FREE ATRP PRODUCTS EVONIK ROEHM GMBH (DE) 2012-09-05 EP claimed
US-8143354-B2 Process for preparing acid-terminated ATRP products EVONIK RÖHM GMBH (DE) 2012-03-27 US claimed
US-7999066-B2 Copper removal from ATRP products by means of addition of sulfur compounds EVONIK ROEHM GMBH (DE) 2011-08-16 US claimed
US-20110144269-A1 DISPERSING AGENT AND ITS USE EVONIK GOLDSCHMIDT GMBH (DE) 2011-06-16 US claimed
US-20090326163-A1 PROCESS FOR PREPARING ACID-TERMINATED ATRP PRODUCTS EVONIK ROEHM GMBH (DE) 2009-12-31 US claimed
US-20090275707-A1 PROCESS FOR PREPARING HALOGEN-FREE ATRP PRODUCTS EVONIK ROEHM GMBH (DE) 2009-11-05 US claimed
US-20090087399-A1 POLYSILOXANE BLOCK COPOLYMERS EVONIK DEGUSSA GMBH (DE) 2009-04-02 US claimed
EP-2887385-B1 Non-volatile memory device method for fabricating the same SK INNOVATION CO LTD (KR) 2020-04-22 EP disclosed
US-10479894-B2 Solution for fabricating nano particles SK INNOVATION CO., LTD. (KR) 2019-11-19 US disclosed
CN-104733464-B Non-volatile memory device and its manufacturing method including electric charge capture layer SK新技术株式会社 2019-11-05 CN disclosed
CN-104733467-B Non-volatile memory device including nanometer floating gate and the method for manufacturing the equipment SK新技术株式会社 2019-10-22 CN disclosed
EP-2886204-B1 Method for fabricating sensor including nanostructure SK INNOVATION CO LTD (KR) 2019-04-24 EP disclosed
US-10269428-B2 Nano structures, device using the same, and method for fabricating the nano structures SK INNOVATION CO., LTD. (KR) 2019-04-23 US disclosed
US-20090165949-A1 METHOD OF BONDING MATERIALS OF CONSTRUCTION USING NANOSCALE, SUPERPARAMAGNETIC POLY(METH)ACRYLATE POLYMERS EVONIK ROEHM GMBH (DE) 2009-07-02 US disclosed
US-20090159834-A1 NANOSCALE SUPERPARAMAGNETIC POLY(METH)ACRYLATE POLYMERS EVONIK ROEHM GMBH (DE) 2009-06-25 US disclosed
US-20090087399-A1 POLYSILOXANE BLOCK COPOLYMERS EVONIK DEGUSSA GMBH (DE) 2009-04-02 US disclosed
US-20090062508-A1 COPPER REMOVAL FROM ATRP PRODUCTS BY MEANS OF ADDITION OF SULFUR COMPOUNDS EVONIK ROEHM GMBH (DE) 2009-03-05 US disclosed
US-20060173149-A1 Method for producing polymers having isotactic or syndiotactic regions BASF AKTIENGESELLSCHAFT (DE) 2006-08-03 US disclosed
JP-2000069993-A OPTICAL RESOLUTION OF 3-HYDROXY-4-MERCAPTOBUTYRIC ACID DERIVATIVE DAI ICHI SEIYAKU CO LTD 2000-03-07 JP disclosed