SCHEMBL37099

SCHEMBL37099

CC=CC(=O)OC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2179903 1.00
SCHEMBL182365 1.00
Methyl Alcohol SCHEMBL5706210 0.97
SCHEMBL30753633 0.97
Methylamine SCHEMBL11680311 0.94
SCHEMBL8952295 0.89 NFE2L2 (0.65)
Isopropylamine SCHEMBL11683394 0.87 HCAR2 (0.55)
Dimethyl Maleate SCHEMBL28874848 0.84 HCAR2 (0.76)
SCHEMBL2575346 0.83 NFE2L2 (0.50)
Propylamine SCHEMBL10560630 0.83 HCAR2 (0.50)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 6586 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12585186-B2 Photoacid generator, chemically amplified resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-24 US claimed
US-20260050214-A1 MOLECULAR RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-02-19 US claimed
US-20260043010-A1 ENONE REDUCTASES CODEXIS, INC. (US) 2026-02-12 US claimed
US-12535733-B2 Molecular resist composition and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-01-27 US claimed
EP-4626973-A1 BUILDING PANEL Dow Global Technologies LLC (US) 2025-10-08 EP claimed
EP-4610284-A1 MONOMER COMPOSITION, METHACRYLIC RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR, AND MOLDED RESIN OBJECT Mitsubishi Chemical Corporation (JP) 2025-09-03 EP claimed
US-20250250376-A1 MONOMER COMPOSITION, METHACRYLIC RESIN COMPOSITION AND PRODUCTION METHOD THEREFOR, AND MOLDED RESIN OBJECT MITSUBISHI CHEMICAL CORPORATION (JP) 2025-08-07 US claimed
US-12371674-B2 Enone reductases CODEXIS, INC. (US) 2025-07-29 US claimed
US-20250230285-A1 MECHANICALLY ROBUST MULTIMATERIAL FOR ADDITIVE MANUFACTURING LAWRENCE LIVERMORE NATIONAL SECURITY, LLC 2025-07-17 US claimed
CN-115033127-B Touch module, touch device and electronic equipment 业泓科技(成都)有限公司 2025-06-24 CN claimed
EP-0021032-B1 PROCESS FOR THE PREPARATION OF ORGANO-TIN TRIHALIDES SOCIETE NATIONALE ELF AQUITAINE (FR) 1983-03-09 EP claimed
US-4324737-A FROM STANNOUS COMPOUND AND ALPHA, BETA-UNSATURATED CARBONYL COMPOUND SOCIETE NATIONALE ELF AQUITAINE (FR) 1982-04-13 US claimed
US-4323676-A Process for preparing cephalosporins TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1982-04-06 US claimed
US-4245088-A Novel 3-acyloxymethyl-cephem compounds useful as intermediates for preparing cephalosporin antibiotics TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1981-01-13 US claimed
US-4166178-A 3-ACYLOXYMETHYL-CEPHEM COMPOUNDS TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) 1979-08-28 US claimed
US-4132732-A CARBOXYLATION OF ALDEHYDES IN THE PRESENCE OF ALKALINE PHENATES MONTEDISON S.P.A. (IT) 1979-01-02 US claimed
US-4111922-A HYDROPHILIC RANDOM INTERPOLYMER FROM QUATERNARY AMMONIUM MONOMERS AND METHOD FOR MAKING SAME JOHNSON & JOHNSON (US) 1978-09-05 US claimed
US-4026831-A ADHESIVES, PAINT RESINS, ELECTROSTATIC INHIBITORS, RUST INHIBITORS MIYOSHI YUSHI KABUSHIKI KAISHA (JA) 1977-05-31 US claimed
US-4010174-A Thiazolinone-(2)-carboxylic acid esters and process therefor BAYER AKTIENGESELLSCHAFT (DT) 1977-03-01 US claimed
US-RE28935-E PSYCHOSEDATIVES, ANTICONVULSANTS BOEHRINGER INGELHEIM GMBH (DT) 1976-08-17 US claimed