Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.48 |
| ▸ | SPHK1 | Q9NYA1 | 2/20 | 0.48 |
| ▸ | FFAR1 | O14842 | 2/20 | 0.48 |
| ▸ | LMNA | P02545 | 2/20 | 0.48 |
| ▸ | CYP2D6 | P10635 | 2/20 | 0.45 |
| ▸ | GMNN | O75496 | 1/20 | 0.45 |
| ▸ | POLB | P06746 | 1/20 | 0.45 |
| ▸ | THPO | P40225 | 1/20 | 0.45 |
| ▸ | MTOR | P42345 | 1/20 | 0.45 |
| ▸ | BLM | P54132 | 1/20 | 0.45 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.45 |
| ▸ | TP53 | P04637 | 1/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | CETP | P11597 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | UBE2N | P61088 | 1/20 | 0.45 |
| ▸ | FFAR4 | Q5NUL3 | 1/20 | 0.43 |
| ▸ | FDPS | P14324 | 3/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9700521 | 1.00 | GPR84 (0.48) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL14446359 | 1.00 | GPR84 (0.48) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL465349 | 0.97 | GPR84 (0.44) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL920167 | 0.89 | ALDH1A1 (0.40) | GPR84SPHK1FFAR1LMNATP53 | |
| SCHEMBL23736361 | 0.85 | TP53 (0.48) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL4888398 | 0.84 | GPR84 (0.54) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL8376762 | 0.82 | GPR84 (0.46) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL753596 | 0.82 | GPR84 (0.46) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL3925045 | 0.82 | GPR84 (0.46) | GPR84SPHK1FFAR1LMNACYP2D6 | |
| SCHEMBL756127 | 0.82 | GPR84 (0.46) | GPR84SPHK1FFAR1LMNACYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 850 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11732217-B2 | Cleaning solution composition and cleaning method using the same | KCTECH CO., LTD. (KR) | 2023-08-22 | — | — | US | claimed |
| US-20220025299-A1 | CLEANING SOLUTION COMPOSITION AND CLEANING METHOD USING THE SAME | KCTECH CO., LTD. (KR) | 2022-01-27 | — | — | US | claimed |
| CN-113969215-A | Cleaning liquid composition and cleaning method using same | 凯斯科技股份有限公司 | 2022-01-25 | — | — | CN | claimed |
| US-12038692-B2 | Method for producing substrate with patterned film and fluorine-containing copolymer | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| US-12038691-B2 | Method for producing substrate with patterned film | CENTRAL GLASS COMPANY, LIMITED (JP) | 2024-07-16 | — | — | US | disclosed |
| WO-2024135498-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, AND COMPOUND | 東京応化工業株式会社 | 2024-06-27 | — | — | WO | disclosed |
| WO-2024127977-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-20 | — | — | WO | disclosed |
| WO-2024122423-A1 | RESIST COMPOSITION, RESIST PATTERN FORMING METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024122425-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-13 | — | — | WO | disclosed |
| WO-2024116780-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID DIFFUSION CONTROL AGENT | 東京応化工業株式会社 | 2024-06-06 | — | — | WO | disclosed |
| WO-2024117106-A1 | RESIST COMPOSITION, RESIST PATTERN FORMATION METHOD, COMPOUND, AND ACID GENERATOR | 東京応化工業株式会社 | 2024-06-06 | — | — | WO | disclosed |
| US-4863842-A | Silver halide photographic light sensitive material | KONICA TECHNOSEARCH CORPORATION (JP) | 1989-09-05 | — | — | US | disclosed |
| US-4752561-A | Light-sensitive silver halide photographic material incorporating metal complex with high quenching constant and an oil soluble dye | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1988-06-21 | — | — | US | disclosed |
| EP-0137271-B1 | METHOD OF IMPROVING THE LIGHT RESISTANCE OF A DYE IMAGE | KONICA CORPORATION (JP) | 1987-11-04 | — | — | EP | disclosed |
| EP-0240568-A1 | SILVER HALIDE PHOTOGRAPHIC MATERIAL | KONICA CORPORATION (JP) | 1987-10-14 | — | — | EP | disclosed |
| US-4675275-A | COLORFAST MAGENTA COUPLERS | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1987-06-23 | — | — | US | disclosed |
| EP-0206461-A2 | Silver halide photographic light-sensitive material | KONICA CORPORATION (JP) | 1986-12-30 | — | — | EP | disclosed |
| EP-0187521-A2 | Light-sensitive silver halide photographic material | KONICA CORPORATION (JP) | 1986-07-16 | — | — | EP | disclosed |
| US-4540653-A | METAL COMPLEX, ANILINO COUPLER | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1985-09-10 | — | — | US | disclosed |
| EP-0137271-A2 | Method of improving the light resistance of a dye image | KONICA CORPORATION (JP) | 1985-04-17 | — | — | EP | disclosed |