SCHEMBL372441

SCHEMBL372441

C=C(C)C(=O)N(CC(C)C)CC(C)C

nearest known ligand 0.48

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
CA1 P00915 4/20 0.48
CA12 O43570 3/20 0.48
CA2 P00918 3/20 0.48
CA9 Q16790 3/20 0.48
TSHR P16473 1/20 0.40
TDP1 Q9NUW8 2/20 0.35
ALDH1A1 P00352 2/20 0.35
MLYCD O95822 2/20 0.34
PIK3CD O00329 1/20 0.32
FPR1 P21462 1/20 0.32
HSD17B10 Q99714 1/20 0.32
ALOX12 P18054 1/20 0.30
LMNA P02545 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6058795 0.89 CA12 (0.43) CA1CA12CA2CA9TSHR
SCHEMBL8376894 0.84 CA12 (0.39) CA1CA12CA2CA9TSHR
SCHEMBL1260015 0.84 TSHR (0.34) CA1CA12CA2CA9TSHR
SCHEMBL6682180 0.79 TSHR (0.39) CA1CA12CA2CA9TSHR
SCHEMBL9021194 0.79 TSHR (0.39) CA1CA12CA2CA9TSHR
SCHEMBL30785342 0.77 ALDH1A1 (0.48) ALDH1A1FPR1HSD17B10LMNA
SCHEMBL2698665 0.76
SCHEMBL11787468 0.75 TRPA1 (0.36) CA1CA12CA2CA9TDP1
SCHEMBL7938759 0.75 CA1 (0.52) CA1CA12CA2CA9TDP1
SCHEMBL7632460 0.74 TET2 (0.34)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070099816-A1 Hard Surface Cleaning Composition THE CLOROX COMPANY 2007-05-03 US claimed
US-5698361-A DIAZONIUM COMPOUND, POLYMERIC BINDER; DURABILITY FUJI PHOTO FILM CO., LTD. (JP) 1997-12-16 US claimed
US-12365815-B2 Polishing liquid, polishing liquid set, polishing method, and defect suppression method RESONAC CORPORATION (JP) 2025-07-22 US disclosed
EP-2960314-B1 POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE FUJIMI INC (JP) 2024-06-26 EP disclosed
WO-2024095637-A1 ACTINIC-RAY-CURABLE COMPOSITION AND CURED OBJECT 三洋化成工業株式会社 2024-05-10 WO disclosed
EP-3159915-B1 METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET FUJIMI INC (JP) 2023-12-06 EP disclosed
CN-110462797-B Polishing composition 福吉米株式会社 2023-09-22 CN disclosed
CN-110998800-B Polishing liquid, polishing liquid set and polishing method 株式会社力森诺科 2023-09-22 CN disclosed
US-20230295466-A1 POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, AND DEFECT SUPPRESSION METHOD RESONAC CORPORATION (JP) 2023-09-21 US disclosed
WO-2023085281-A1 ADHESIVE AND ADHESIVE TAPE 三菱ケミカル株式会社 2023-05-19 WO disclosed
US-11649377-B2 Polishing liquid, polishing liquid set and polishing method RESONAC CORPORATION (JP) 2023-05-16 US disclosed
US-6878789-B2 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 2005-04-12 US disclosed
EP-0945470-B1 Preparation process of acrylic acid ester polymer KURARAY CO (JP) 2004-10-13 EP disclosed
US-20020032290-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 2002-03-14 US disclosed
US-6329480-B1 POLYMERIZING ACRYLIC ACID ESTER, ACRYLIC/METHACRYLIC MONOMER PRESENCE OF AN ORGANOLITHIUM COMPOUND AND AN ORGANOALUMINUM COMPOUND TO FORM BLOCK COPOLYMER KURARAY CO., LTD. (JP) 2001-12-11 US disclosed
EP-0945470-A1 Preparation process of acrylic acid ester polymer KURARAY CO., LTD. (JP) 1999-09-29 EP disclosed
EP-0377199-B1 UV-CROSS-LINKABLE COMPOSITIONS BASED ON POLYMERS OF (METH)ACRYLIC ESTERS BASF Aktiengesellschaft (DE) 1993-05-26 EP disclosed
US-5128386-A Hot melt adhesives BASF AKTIENGESELLSCHAFT (DE) 1992-07-07 US disclosed
EP-0448741-A1 UV-curable compositions based on polymers of (meth)acrylic esters BASF Aktiengesellschaft (DE) 1991-10-02 EP disclosed
EP-0377199-A2 UV-cross-linkable compositions based on polymers of (meth)acrylic esters BASF Aktiengesellschaft (DE) 1990-07-11 EP disclosed