Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8362093 | 0.94 | TDP1 (0.40) | TDP1ALDH1A1HSD17B10 | |
| SCHEMBL309028 | 0.87 | TDP1 (0.44) | TDP1ALDH1A1HSD17B10 | |
| SCHEMBL28715657 | 0.79 | LMNA (0.39) | — | |
| SCHEMBL8642402 | 0.79 | TDP1 (0.38) | TDP1ALDH1A1 | |
| SCHEMBL8433764 | 0.79 | TDP1 (0.38) | TDP1ALDH1A1 | |
| SCHEMBL10527794 | 0.78 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL7637758 | 0.77 | TDP1 (0.50) | TDP1ALDH1A1 | |
| SCHEMBL18381052 | 0.75 | ALDH1A1 (0.35) | ALDH1A1 | |
| SCHEMBL3740401 | 0.73 | TDP1 (0.37) | TDP1ALDH1A1HSD17B10 | |
| SCHEMBL27452746 | 0.73 | TSHR (0.40) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 46 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12365815-B2 | Polishing liquid, polishing liquid set, polishing method, and defect suppression method | RESONAC CORPORATION (JP) | 2025-07-22 | — | — | US | disclosed |
| EP-2960314-B1 | POLISHING COMPOSITION AND METHOD FOR MANUFACTURING POLISHED ARTICLE | FUJIMI INC (JP) | 2024-06-26 | — | — | EP | disclosed |
| EP-3159915-B1 | METHOD FOR POLISHING SILICON WAFER, POLISHING COMPOSITION, AND POLISHING COMPOSITION SET | FUJIMI INC (JP) | 2023-12-06 | — | — | EP | disclosed |
| CN-110462797-B | Polishing composition | 福吉米株式会社 | 2023-09-22 | — | — | CN | disclosed |
| US-20230295466-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, AND DEFECT SUPPRESSION METHOD | RESONAC CORPORATION (JP) | 2023-09-21 | — | — | US | disclosed |
| US-11649377-B2 | Polishing liquid, polishing liquid set and polishing method | RESONAC CORPORATION (JP) | 2023-05-16 | — | — | US | disclosed |
| EP-3133638-B1 | COMPOSITION FOR POLISHING SILICON WAFERS | FUJIMI INC (JP) | 2021-10-27 | — | — | EP | disclosed |
| CN-106463386-B | Method for polishing silicon wafer, polishing composition, and polishing composition set | 福吉米株式会社 | 2020-12-01 | — | — | CN | disclosed |
| EP-2957613-B1 | POLISHING COMPOSITION, METHOD FOR PRODUCING POLISHING COMPOSITION AND METHOD FOR PRODUCING POLISHED ARTICLE | FUJIMI INC (JP) | 2020-11-18 | — | — | EP | disclosed |
| US-20200283659-A1 | POLISHING LIQUID, POLISHING LIQUID SET, POLISHING METHOD, ANDDEFECT SUPPRESSION METHOD | RESONAC CORPORATION (JP) | 2020-09-10 | — | — | US | disclosed |
| EP-1956642-A1 | POLISHING AGENT FOR SILICON OXIDE, LIQUID ADDITIVE, AND METHOD OF POLISHING | Hitachi Chemical Co., Ltd. (JP) | 2008-08-13 | — | — | EP | disclosed |
| US-20070175104-A1 | Polishing slurry for silicon oxide, additive liquid and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2007-08-02 | — | — | US | disclosed |
| US-20060148667-A1 | Cmp polishing compound and polishing method | HITACHI CHEMICAL CO., LTD. (JP) | 2006-07-06 | — | — | US | disclosed |
| US-6932964-B1 | Copolymer of a tert-butyl acrylate and/or an N-tert-butylacrylamide, at least acrylic mono- and/or dicarboxylic acid, and at least one ethoxylated acrylic compound; high propellant gas compatibility and no \"flaking\" effect; hair sprays | BASF AKTIENGESELLSCHAFT (DE) | 2005-08-23 | — | — | US | disclosed |
| US-6469135-B2 | EVAPORATING THE VOLATILE CONSTITUENTS FROM AQUEOUS DISPERSIONS OF FILM-FORMING POLYMERS IN THE PRESENCE OF SALTS OF OLIGOMERIC ARYLSULFONIC ACID-FORMALDEHYDE CONDENSATES AS DRYING ASSISTANTS; ANIONIC SURFACTANT | BASF AKTIENGESELLSCHAFT (DE) | 2002-10-22 | — | — | US | disclosed |
| US-20020062006-A1 | Preparing polymer powders | BASF AKITENGESELLSHAFT (DE) | 2002-05-23 | — | — | US | disclosed |
| CN-1226200-A | Manufacture of laminated film and printed wiring board | HITACHI CHEMICAL CO LTD (JP) | 1999-08-18 | — | — | CN | disclosed |
| EP-0294648-B1 | NOVEL COPOLYMER AND WATER- AND OIL-REPELLENT COMPRISING THE SAME | DAIKIN INDUSTRIES, LIMITED (JP) | 1993-01-07 | — | — | EP | disclosed |
| US-5055538-A | (Meth)Acrylate copolymers with a perfluoroalkylmonomer, stearyl acrylate or methacrylate; antislipping agents; stable dry cleaning and washing agents | DAIKIN INDUSTRIES LTD. (JP) | 1991-10-08 | — | — | US | disclosed |
| EP-0294648-A2 | Novel copolymer and water- and oil-repellent comprising the same | DAIKIN INDUSTRIES, LIMITED (JP) | 1988-12-14 | — | — | EP | disclosed |