SCHEMBL372729

SCHEMBL372729

C=CC(=O)N(CCCCCCC)C(=O)C=C

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ZDHHC20 Q5W0Z9 4/20 0.57
ZDHHC2 Q9UIJ5 2/20 0.57
FAAH O00519 1/20 0.43
EPHX2 P34913 1/20 0.40
TSHR P16473 4/20 0.39
HPGD P15428 1/20 0.39
DNM1 Q05193 3/20 0.39
THRA P10827 3/20 0.39
THRB P10828 3/20 0.39
MEN1 O00255 1/20 0.39
KMT2A Q03164 1/20 0.39
CES2 O00748 3/20 0.38
CES1 P23141 3/20 0.38
ALDH1A1 P00352 1/20 0.37
SLC22A6 Q4U2R8 1/20 0.37
SLC22A8 Q8TCC7 1/20 0.37
GPR84 Q9NQS5 1/20 0.37
PPARG P37231 1/20 0.37
PPARD Q03181 1/20 0.37
PPARA Q07869 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10657941 1.00 ZDHHC20 (0.57) ZDHHC20ZDHHC2FAAHEPHX2TSHR
SCHEMBL7647635 1.00 ZDHHC20 (0.57) ZDHHC20ZDHHC2FAAHEPHX2TSHR
SCHEMBL25108824 1.00 ZDHHC20 (0.57) ZDHHC20ZDHHC2FAAHEPHX2TSHR
SCHEMBL10936944 0.94 ZDHHC20 (0.53) ZDHHC20ZDHHC2FAAHEPHX2TSHR
SCHEMBL10664833 0.91 ZDHHC20 (0.47) ZDHHC20ZDHHC2FAAHTSHRHPGD
SCHEMBL13862588 0.89 ZDHHC20 (0.43) ZDHHC20ZDHHC2TSHRALDH1A1
SCHEMBL13862593 0.89 ZDHHC20 (0.43) ZDHHC20ZDHHC2TSHRALDH1A1
SCHEMBL28572657 0.84 ZDHHC20 (0.48) ZDHHC20ZDHHC2FAAHEPHX2TSHR
SCHEMBL137967 0.83 ZDHHC20 (0.72) ZDHHC20ZDHHC2FAAHTSHRHPGD
SCHEMBL372601 0.83 ZDHHC20 (0.72) ZDHHC20ZDHHC2FAAHTSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2410558-A2 Polishing slurry for silicon oxide, additive liquid and polishing method Hitachi Chemical Co., Ltd. (JP) 2012-01-25 EP disclosed