Predicted protein targets (top 15)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.38 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.38 |
| ▸ | PDE4A | P27815 | 1/20 | 0.38 |
| ▸ | GBA1 | P04062 | 1/20 | 0.35 |
| ▸ | OR51E2 | Q9H255 | 1/20 | 0.35 |
| ▸ | PGD | P52209 | 1/20 | 0.33 |
| ▸ | SLC7A5 | Q01650 | 1/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | ACHE | P22303 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.30 |
| ▸ | MEN1 | O00255 | 1/20 | 0.30 |
| ▸ | USP2 | O75604 | 1/20 | 0.30 |
| ▸ | MAPT | P10636 | 1/20 | 0.30 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Glycolic Acid SCHEMBL11314038 | 0.94 | TSHR (0.42) | TSHRHTTCYP2C9PDE4AGBA1 | |
| SCHEMBL373842 | 0.90 | TSHR (0.44) | TSHRHTTACHEALDH1A1MEN1 | |
| Propene SCHEMBL10796385 | 0.88 | TSHR (0.44) | TSHRHTTCYP2C9PDE4AGBA1 | |
| SCHEMBL2963222 | 0.88 | TSHR (0.37) | TSHRHTTCYP2C9PDE4AGBA1 | |
| Ether SCHEMBL2959250 | 0.88 | ALDH1A1 (0.41) | TSHRHTTCYP2C9PDE4AGBA1 | |
| SCHEMBL15512351 | 0.86 | TSHR (0.43) | TSHRHTTCYP2C9PDE4AGBA1 | |
| Ethylene SCHEMBL2962958 | 0.85 | TSHR (0.34) | TSHRHTTALDH1A1 | |
| Ether SCHEMBL2959187 | 0.85 | ALDH1A1 (0.39) | TSHRACHEALDH1A1 | |
| SCHEMBL28411335 | 0.83 | TSHR (0.50) | TSHRHTTCYP2C9PDE4APGD | |
| SCHEMBL15512221 | 0.83 | TSHR (0.50) | TSHRHTTCYP2C9PDE4AOR51E2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-6224432-A | — | — | None | — | — | JP | disclosed |
| US-9910334-B2 | Semiconductor device and fabrication method thereof | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2018-03-06 | — | — | US | disclosed |
| US-20170052398-A1 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2017-02-23 | — | — | US | disclosed |
| US-9431431-B2 | Semiconductor device and fabrication method thereof | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2016-08-30 | — | — | US | disclosed |
| US-20140160385-A1 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2014-06-12 | — | — | US | disclosed |
| US-8575619-B2 | Semiconductor device and fabrication method thereof | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8558241-B2 | Semiconductor device and fabrication method thereof | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2013-10-15 | — | — | US | disclosed |
| US-8471262-B2 | Semiconductor device and fabrication method thereof | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2013-06-25 | — | — | US | disclosed |
| US-20130001568-A1 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2013-01-03 | — | — | US | disclosed |
| US-20130001583-A1 | SEMICONDUCTOR DEVICE AND FABRICATION METHOD THEREOF | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2013-01-03 | — | — | US | disclosed |
| US-6306694-B1 | Process of fabricating a semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2001-10-23 | — | — | US | disclosed |
| US-20010029089-A1 | Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device | TANAKA KOICHIRO (JP) | 2001-10-11 | — | — | US | disclosed |
| US-20010021566-A1 | ANODIC OXIDIZATION METHODS | SHARP KABUSHI KI KAISHA (JP) | 2001-09-13 | — | — | US | disclosed |
| US-6246524-B1 | Beam homogenizer, laser irradiation apparatus, laser irradiation method, and method of manufacturing semiconductor device | SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2001-06-12 | — | — | US | disclosed |
| EP-1055479-A2 | Laser irradiation apparatus | SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2000-11-29 | — | — | EP | disclosed |
| CN-1272695-A | Electro-optical device and electronic apparatus | SEMICONDUCTOR ENERGY LAB (JP) | 2000-11-08 | — | — | CN | disclosed |
| EP-1045447-A2 | Electro-optical device and electronic equipment | SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2000-10-18 | — | — | EP | disclosed |
| EP-1031873-A2 | Semiconductor device and fabrication method thereof | SEL SEMICONDUCTOR ENERGY LABORATORY CO., LTD. (JP) | 2000-08-30 | — | — | EP | disclosed |
| JP-H06224432-A | SEMICONDUCTOR DEVICE AND MANUFACTURE THEREOF | SEMICONDUCTOR ENERGY LAB CO LTD | 1994-08-12 | — | — | JP | disclosed |
| US-4005189-A | Process of suppressing odors employing deodorants containing esters of aliphatic hydroxycarboxylic acids | HENKEL & CIE G.M.B.H. (DT) | 1977-01-25 | — | — | US | disclosed |