Predicted protein targets (top 12)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RARB | P10826 | 3/20 | 0.43 |
| ▸ | FFAR4 | Q5NUL3 | 2/20 | 0.42 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | TSHR | P16473 | 1/20 | 0.40 |
| ▸ | PTPN11 | Q06124 | 3/20 | 0.39 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.39 |
| ▸ | LTA4H | P09960 | 1/20 | 0.39 |
| ▸ | PLA2G4B | P0C869 | 2/20 | 0.39 |
| ▸ | PDK2 | Q15119 | 1/20 | 0.39 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.39 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrogen Sulfide SCHEMBL1088675 | 0.79 | DRD2 (0.43) | — | |
| Trifluoromethanesulfonic Acid SCHEMBL4620193 | 0.78 | RARB (0.45) | RARBFFAR4TP53TSHRPTPN11 | |
| Trifluoromethanesulfonic Acid SCHEMBL3740925 | 0.78 | RARB (0.45) | RARBFFAR4TP53TSHRPTPN11 | |
| Trifluoromethanesulfonic Acid SCHEMBL4620136 | 0.78 | RARB (0.45) | RARBFFAR4TP53TSHRPTPN11 | |
| SCHEMBL16076556 | 0.78 | KCNA3 (0.51) | KCNA3 | |
| SCHEMBL28194312 | 0.77 | LTA4H (0.57) | RARBTP53TSHRPTPN11LTA4H | |
| SCHEMBL12646855 | 0.77 | KDM4E (0.42) | FFAR4PTPN1 | |
| SCHEMBL30705191 | 0.77 | DRD2 (0.44) | — | |
| Iodide SCHEMBL8736416 | 0.77 | PTGDR2 (0.47) | PTPN11PLA2G4BPDK2PTPN1 | |
| SCHEMBL7110393 | 0.76 | PDK2 (0.41) | RARBTP53TSHRPTPN11LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7833693-B2 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | AZ ELECTRONIC MATERIALS USA CORP. | 2010-11-16 | — | — | US | disclosed |
| US-7521170-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-04-21 | — | — | US | disclosed |
| US-20070015084-A1 | Iodonium or sulfonium di-(tetrafluoroethyl sulfonate) ether acid generators; imaging negative and positive patterns in semiconductors and photoresists; microlithography; high photosensitivity | MERCK PATENT GMBH (DE) | 2007-01-18 | — | — | US | disclosed |