SCHEMBL3746961

SCHEMBL3746961

O=C1C(F)(F)C(F)(F)C1(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2146960 0.92
SCHEMBL196743 0.88 MEN1 (0.31)
SCHEMBL8770624 0.88 MEN1 (0.31)
SCHEMBL9936034 0.88 MEN1 (0.31)
SCHEMBL5075454 0.85
SCHEMBL5081324 0.82 ALDH1A1 (0.32)
SCHEMBL31099205 0.75
SCHEMBL4812608 0.72 ALDH1A1 (0.35)
SCHEMBL9336451 0.70 ALDH1A1 (0.33)
SCHEMBL9336501 0.70 ALDH1A1 (0.33)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 43 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20070224829-A1 Use Of Hypofluorites, Fluoroperoxides, And/Or Fluorotrioxides As Oxidizing Agent In Fluorocarbon Etch Plasmas AIR PRODUCTS AND CHEMICALS, INC. (US) 2007-09-27 US claimed
US-20050014383-A1 Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas VERSUM MATERIALS US, LLC 2005-01-20 US claimed
EP-1498940-A2 Use of hypofluorites, fluoroperoxides, and/or fluorotrioxides as oxidizing agent in fluorocarbon etch plasmas AIR PRODUCTS AND CHEMICALS, INC. (US) 2005-01-19 EP claimed
CN-109956847-B Aqueous phase preparation method of fluorine-containing cyclobutene 中蓝晨光化工研究设计院有限公司 2022-05-20 CN disclosed
CN-110178242-B Nanostructured articles 3M创新有限公司 2022-01-11 CN disclosed
CN-105016990-A Synthetic method of perfluorocyclobutanone SHANGHAI 3F NEW MATERIAL CO LTD 2015-11-04 CN disclosed
CN-105016990-A Synthetic method of perfluorocyclobutanone SHANGHAI 3F NEW MATERIAL CO LTD 2015-11-04 CN disclosed
US-7901869-B2 Double patterning with a double layer cap on carbonaceous hardmask APPLIED MATERIALS, INC. (US) 2011-03-08 US disclosed
US-7838432-B2 Etch process with controlled critical dimension shrink APPLIED MATERIALS, INC. (US) 2010-11-23 US disclosed
US-20080299494-A1 DOUBLE PATTERNING WITH A DOUBLE LAYER CAP ON CARBONACEOUS HARDMASK APPLIED MATERIALS, INC. 2008-12-04 US disclosed
EP-1983556-A2 Etch Process with Controlled Critical Dimension Shrink Applied Materials, Inc. (US) 2008-10-22 EP disclosed
EP-0164124-B1 TRIS(DISBUSTITUTED AMINO)SULFONIUM PERFLUOROALKOXIDES AND PERFLUOROALKYLMERCAPTIDES AND PROCESS FOR THEIR PREPARATION E.I. DU PONT DE NEMOURS AND COMPANY (US) 1988-11-30 EP disclosed
US-4628094-A SALT FORMATION, CHEMICAL INTERMEDIATES FOR PERFLUOROALKYL ETHERS E. I. DU PONT DE NEMOURS AND COMPANY (US) 1986-12-09 US disclosed
US-4621125-A ADDITION POLYMERIZATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1986-11-04 US disclosed
US-4603017-A HEAT EXCHANGING FLUIDS, LUBRICANTS HOECHST ATKIENGESELLSCHAFT (DE) 1986-07-29 US disclosed
EP-0164124-A2 Tris(disbustituted amino)sulfonium perfluoroalkoxides and perfluoroalkylmercaptides and process for their preparation E.I. DU PONT DE NEMOURS AND COMPANY (US) 1985-12-11 EP disclosed
US-4524031-A HEAT TRANSFER FLUIDS HOECHST AKTIENGESELLSCHAFT (DE) 1985-06-18 US disclosed
EP-0047948-B1 PROCESS FOR THE PRODUCTION OF POLYFLUOROCARBONYL COMPOUNDS AND SOME REPRESENTATIVES OF THIS FAMILY HOECHST AKTIENGESELLSCHAFT (DE) 1983-09-21 EP disclosed
EP-0047948-A2 Process for the production of polyfluorocarbonyl compounds and some representatives of this family HOECHST AKTIENGESELLSCHAFT (DE) 1982-03-24 EP disclosed
US-4021489-A Reaction of sulfur trioxide with cyclic (4- and 5-membered ring) fluorovinylethers E. I. DU PONT DE NEMOURS AND COMPANY (US) 1977-05-03 US disclosed