SCHEMBL3754455

SCHEMBL3754455

CC(C)(C)Oc1ccc(C(F)=C(F)F)c(F)c1

nearest known ligand 0.36

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
CPS1 P31327 9/20 0.36
KIF11 P52732 1/20 0.35
MAOB P27338 4/20 0.34
MAOA P21397 1/20 0.33
PARP10 Q53GL7 2/20 0.32
MEN1 O00255 1/20 0.31
ALDH1A1 P00352 1/20 0.31
LMNA P02545 1/20 0.31
GAA P10253 1/20 0.31
HPGD P15428 1/20 0.31
ALOX12 P18054 1/20 0.31
KMT2A Q03164 1/20 0.31
PDE2A O00408 1/20 0.31
PARP14 Q460N5 1/20 0.30
ABL1 P00519 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27620395 0.88 MAOB (0.36) CPS1KIF11MAOBMAOAPARP10
SCHEMBL27601794 0.83 CPS1 (0.36) CPS1KIF11MAOBMAOAPARP10
SCHEMBL2592316 0.79 RARB (0.45) CPS1MAOBMAOAALDH1A1
SCHEMBL7639747 0.77
SCHEMBL6764137 0.75 KIF11 (0.42) KIF11MAOBMAOAPDE2AABL1
SCHEMBL12180436 0.72 KIF11 (0.40) KIF11MEN1ALDH1A1GAAKMT2A
SCHEMBL20244888 0.71 SLC6A4 (0.39) KIF11GAAPDE2AABL1
SCHEMBL6764225 0.71 SLC6A4 (0.41) KIF11ALDH1A1HPGDKMT2APDE2A
SCHEMBL7878969 0.70
SCHEMBL27620383 0.70 CYP1A1 (0.36) KIF11PDE2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8758963-B2 Holographic reticle and patterning method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2014-06-24 US disclosed
US-20120295185-A1 Holographic Reticle and Patterning Method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2012-11-22 US disclosed
US-8227150-B2 Holographic reticle and patterning method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2012-07-24 US disclosed
US-20100297538-A1 Holographic Reticle and Patterning Method TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2010-11-25 US disclosed